Method used for improving Nb-Si based alloy oxidation resistance via electron beam remelting
A technology of electron beam remelting and oxidation resistance, which is applied in the field of improving the oxidation resistance of Nb-Si-based alloys by using electron beam surface remelting technology, can solve the problems of insufficient high-temperature oxidation performance of Nb-Si-based alloys, and achieve improved high-temperature Oxidation resistance, effect of improving high temperature oxidation resistance
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Embodiment 1
[0032] 1. Using high-purity Nb and Si as synthetic raw materials, the Nb-20Si alloy master ingot was obtained by arc melting technology, and a circular substrate with a diameter of 60mm and a thickness of 15mm was cut by wire cutting, and the surface of the sample was polished, cleaned and dried spare;
[0033] 2. Fix the Nb-20Si alloy substrate on the workbench, and pump the sealed forming cavity into a high vacuum state;
[0034] 3. Preheat the Nb-20Si alloy substrate with a high-energy electron beam. The preheating temperature is 900°C. The specific preheating parameters are: accelerating voltage 30kV, current 9.0mA, and electron beam focal spot size 100μm;
[0035] 4. After the preheating is over, set the corresponding processing parameters, scan the surface of the Nb-20Si alloy substrate with an electron beam, the surface of the sample is melted and solidified, and a remelting layer is formed. The specific remelting parameters: accelerating voltage 30kV, scanning current ...
Embodiment 2
[0038]1. Using high-purity Nb, Si, Ti, Cr, and Al as synthetic raw materials, four kinds of Nb-Si-based alloy master ingots were obtained by vacuum induction melting technology. The alloy components were Nb-16Si-24Ti-2Cr-2Al, Nb- 18Si-24Ti-2Cr-2Al, Nb-20Si-24Ti-2Cr-2Al, Nb-22Si-24Ti-2Cr-2Al, using wire cutting to cut the circular substrates of the four alloys, with a diameter of 70mm and a thickness of 15mm, and the samples The surface is polished, cleaned and dried for later use;
[0039] 2. Fix the four alloy substrates on the workbench at the same time, and pump the sealed forming cavity into a high vacuum state;
[0040] 3. Use high-energy electron beams to preheat four kinds of Nb-Si alloy substrates. The preheating temperature is 1200°C. The specific preheating parameters are: accelerating voltage 30kV, scanning current 20mA, and electron beam focal spot size 100μm;
[0041] 4. After the preheating is over, set the corresponding processing parameters, and scan the surfa...
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