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Micro-nano structure inscribing device based on sample rotation and laser double-beam interference

A double-beam interference, micro-nano structure technology, which is applied in photolithography process exposure devices, microlithography exposure equipment, optics, etc., can solve the problems of inconvenient operation, high price, complicated optical path, etc. Easy to operate, simple light path effect

Inactive Publication Date: 2017-02-22
LANZHOU UNIVERSITY OF TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The main disadvantages of the existing laser interference lithography technology are: 1) The micro-nano structures that can be written by two-beam laser interference are limited to one-dimensional periodic gratings, which undoubtedly limits the wide application of photolithographic structures
2) The optical path required to write complex two-dimensional periodic optical structures using multi-beam interference is complex, expensive, and inconvenient to operate

Method used

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  • Micro-nano structure inscribing device based on sample rotation and laser double-beam interference
  • Micro-nano structure inscribing device based on sample rotation and laser double-beam interference
  • Micro-nano structure inscribing device based on sample rotation and laser double-beam interference

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Effect test

Embodiment 1

[0034] refer to figure 1 The structure diagram of a micro-nano structure writing device based on sample rotation and laser double-beam interference is shown. The He-Cd laser source 1 selects the laser beam with an emission wave of 325nm, opens the photoelectric shutter 2, and the laser beam passes through the photoelectric shutter 2. , after passing through the short focal length lens 3 and the long focal length lens 4, the beam is expanded, and then divided into two beams of coherent light with the same intensity by the beam splitter 5, emitted from two directions, and finally reflected by the plane reflector A6 and the plane reflector B7 To expose it on the photoresist sample 8, the incident angle θ =10°, after exposure for a certain period of time, a one-dimensional periodic grating structure can be obtained through subsequent developing, fixing and other processes. Such as image 3 shown.

Embodiment 2

[0036] refer to figure 1 Shown is a schematic structural diagram of a micro-nano structure writing device based on sample rotation and laser double-beam interference. After the first exposure of the sample with a 325nm laser beam for a certain period of time, the photoelectric shutter 2 is closed, and the photolithographic process is performed through the sample rotation system 9. The glue sample 8 is rotated 90°, and then the photoelectric shutter 2 is opened to expose the photoresist sample 8 again for the same time T , refer to Example 1 for other steps, the finally obtained micro-nano structure is a two-dimensional periodic lattice structure, such as Figure 4 shown.

Embodiment 3

[0038] refer to figure 1 Shown is a schematic structural diagram of a micro-nano structure writing device based on sample rotation and laser double-beam interference. The photoresist sample 8 is exposed three times, and the photoelectric shutter 2 is closed after each exposure for the same time, and the sample rotation controller 9 enables The photoresist sample 8 is rotated by 60°, and other steps refer to Example 1 to obtain a hexagonal lattice structure, such as Figure 5 shown.

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Abstract

The invention discloses a micro-nano structure inscribing device based on sample rotation and laser double-beam interference. The micro-nano structure inscribing device comprises a He-Cd laser, a photoelectric shutter, a short-focus lens, a long-focus lens, a beam splitter, a planar reflector A, a planar reflector B, a photoresist sample and a sample rotation control system, wherein a laser beam emitted from the He-Cd laser is split into two laser beams with equal intensity after passing through the photoelectric shutter, the short-focus lens, the long-focus lens and the beam splitter, is reflected by the planar reflector A and the planar reflector B and then irradiates the photoresist sample for exposure. By rotation of the photoresist sample and multiple times of double-beam interference exposure as well as selection for the wavelenth of the laser, various micro-nano structures such as a one-dimensional grating, a two-dimensional lattice, a hexagon, concentric equal-interval rings and vertical-horizontal two-dimensional rectangular lattices with different periods can be prepared by inscription. The micro-nano structure inscribing device disclosed by the invention has the advantages of simple structure and low cost, and has wide application in the field of manufacture of the micro-nano structure.

Description

technical field [0001] The invention belongs to the technical field of laser interference writing micro-nano structures, and relates to a device for laser interference writing micro-nano structures, in particular to a device for writing micro-nano structures based on sample rotation and laser double-beam interference. Background technique [0002] Micro-nano structures have important applications in photonic crystals, diffraction gratings, biosensors and other fields. At present, the use of laser interference to write micro-nano structures mostly uses two-beam laser interference to write one-dimensional periodic grating structures on the sample surface or uses multi-beam laser interference to write complex two-dimensional periodic structures. [0003] The main disadvantages of the existing laser interference lithography technology are: 1) The micro-nano structures that can be written by two-beam laser interference are limited to one-dimensional periodic gratings, which undou...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2008G03F7/70025G03F7/70408G03F7/70
Inventor 王向贤陈宜臻王茹朱小帅张东阳庞志远杨华
Owner LANZHOU UNIVERSITY OF TECHNOLOGY
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