Multi-stage atmosphere isolation device of coating production line

Abstract

The invention relates to a multi-stage atmosphere isolation device of a coating production line, and aims to isolate the working atmosphere of two adjacent coating chambers in the coating production line. The multi-stage atmosphere isolation device comprises at least two isolation chambers which are adjacently connected in sequence and separated by a partition, and at least two vacuum pumps communicated with the isolation chambers in a one-to-one correspondence manner, wherein a narrow-gap channel communicated with the two adjacent isolation chambers respectively is further arranged in the middle of the partition; two ends of channel wall plates on the upper and lower sides of each narrow-gap channel respectively extend a preset length from each partition into the two isolation chambers communicated with the narrow-gap channel. According to the multi-stage atmosphere isolation device of the coating production line, on the basis of a conventional gas trap isolation mode, the number of stages of gas strap isolation is increased, and the adjacent isolation chambers are connected through the narrow-gap channels to realize narrow-gap isolation with better isolation effect, so that the atmosphere isolation effect of the whole isolation device is enhanced; the atmosphere isolation demand for high precision requirement can be effectively met; the multi-stage atmosphere isolation device is particularly suitable for being used in various coating processes, such as IMITO, for synchronous and continuous working under various process atmospheres.

Description

technical field [0001] The invention relates to the technical field of substrate coating production, in particular to a multi-stage atmosphere isolation device for a coating production line. Background technique [0002] In the coating production of glass substrates, the IMITO process (anti-image ITO) introduces an optical film layer (AR film) to make the reflectivity of the ITO sensor layer equal to that of the AR film layer, so that the naked eye cannot recognize the ITO sensor layer. "Effect. IMITO process requires coating production equipment with SiO 2 +ITO co-plating function, however, SiO on PVD equipment 2 The film-forming atmosphere of ITO is very different from that of ITO. In order to realize the combined plating function, an efficient atmosphere isolation device must be equipped. [0003] There are two main types of existing atmosphere isolation devices: Rotary chamber isolation devices and air trap type isolation devices. Among them, the rotating chamber iso...

AI Technical Summary

Problems solved by technology

Among them, the rotating chamber isolation device can achieve a good atmosphere isolation effect, but this isolation device is exclusive to the AR film coating model, and the cost is too high; while the air trap type isolation device is low in cost, but its atmosphere isolation effect Limited, unable to meet the production needs of the IMITO process

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