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Method for preparing oxygen tantalum nitride photocatalytic material by means of waste tantalum capacitors

A photocatalytic material, tantalum oxynitride technology, applied in the field of waste tantalum capacitor recycling, can solve the problems of TaON photocatalytic material industrial application limitation, high-purity tantalum oxide is expensive, etc., to achieve broad application prospects and economic benefits, Reduced need for tantalum ore, effects of high photocatalytic activity

Active Publication Date: 2017-01-04
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, high-purity tantalum oxide is expensive, which limits the industrial application of TaON photocatalytic materials.

Method used

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  • Method for preparing oxygen tantalum nitride photocatalytic material by means of waste tantalum capacitors
  • Method for preparing oxygen tantalum nitride photocatalytic material by means of waste tantalum capacitors

Examples

Experimental program
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Effect test

Embodiment 1

[0031] The method for preparing a visible light-responsive TaON photocatalytic material from waste tantalum capacitors described in the present application includes the following steps:

[0032] 1. Mechanical crushing: Take 10g of a resin-encapsulated waste tantalum capacitor with a tantalum content of 35.9%. The analysis results are as follows: Ta: 35.9%, Ag: 0.3%, Ni: 2.08%, Fe: 3.85%. Use a ball mill to crush waste tantalum capacitors to obtain materials with an average particle size of 0.5 to 0.01 mm;

[0033] 2. Electrostatically sort the crushed materials to separate metal and non-metal;

[0034] 3. Magnetic separation of metal materials to separate nickel and iron; then sieving to obtain Ta enriched powder;

[0035] 4. Put the Ta-enriched powder in a tube furnace and perform chlorination treatment to obtain TaCl 5 . Control the flow of argon to 50ml / min, the mass ratio of Ta-enriched powder to chloride salt is 1:1, the reaction temperature is 500℃, and the reaction time is 4h;...

Embodiment 2

[0048] The method for preparing a visible light-responsive TaON photocatalytic material from waste tantalum capacitors described in the present application includes the following steps:

[0049] 1. Mechanical crushing: Take 10g of a resin-encapsulated waste tantalum capacitor with a tantalum content of 35.9%, and the analysis results are as follows: Ta: 35.9%, Ag: 0.3%, Ni: 2.08%, Fe: 3.85%. Crush waste tantalum capacitors with a hammer crusher to obtain materials with an average particle size of 0.5 to 0.01 mm;

[0050] 2. The crushed materials are separated by hydrocyclone to separate metal and non-metal;

[0051] 3. Magnetic separation of metal materials to separate nickel and iron; then sieving to obtain Ta enriched powder;

[0052] 4. Put the Ta-enriched powder in a tube furnace and perform chlorination treatment to obtain TaCl 5 . Control the flow of argon to 80ml / min, the mass ratio of Ta-enriched powder to chloride salt is 1:2, the reaction temperature is 600℃, and the reacti...

Embodiment 3

[0058] The method for preparing a visible light-responsive TaON photocatalytic material from waste tantalum capacitors described in the present application includes the following steps:

[0059] 1. Mechanical crushing: Take 10g of a resin-encapsulated waste tantalum capacitor with a tantalum content of 35.9%, and the analysis results are as follows: Ta: 35.9%, Ag: 0.3%, Ni: 2.08%, Fe: 3.85%. Crush waste tantalum capacitors with a hammer crusher to obtain materials with an average particle size of 0.5 to 0.01 mm;

[0060] 2. Electrostatically sort the crushed materials to separate metal and non-metal;

[0061] 3. Magnetic separation of metal materials to separate nickel and iron; then sieving to obtain Ta enriched powder;

[0062] 4. Put the Ta-enriched powder in a tube furnace and perform chlorination treatment to obtain TaCl 5 . Control the flow rate of argon to 100ml / min, the mass ratio of Ta-enriched powder to chloride salt is 1:3, the reaction temperature is 650℃, and the reactio...

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Abstract

Provided is a method for preparing an oxygen tantalum nitride photocatalytic material by means of waste tantalum capacitors. The method comprises the following steps that various waste tantalum capacitors are subjected to mechanical crushing and decladding; metal and nonmetal are separated; metal materials are subjected to magnetic separation, and ferro-nickel magnetic materials are separated; screening is conducted, and tantalum-containing powder is obtained; the tantalum-containing powder is subjected to chlorination treatment, and tantalum chloride is obtained; tantalum chloride is dissolved into an alcoholic solution, ammonia gas is introduced to separate ammonium chloride out, filtration is conducted, and an alcoholic solution of tantalum is obtained; the alcoholic solution of tantalum is hydrolyzed, tantalum oxide sol is obtained, drying is conducted, and tantalum oxide gel is obtained; the tantalum oxide gel is subjected to high-temperature calcination in ammonia gas atmosphere, and the oxygen tantalum nitride photocatalytic material is obtained. The method for preparing the oxygen tantalum nitride photocatalytic material by means of the waste tantalum capacitors has the advantages that the waste tantalum capacitors in the market are utilized, requirements of photocatalytic tantalum material preparation on tantalite ore are reduced, and nickel and iron electrodes in the waste tantalum capacitors are recycled.

Description

Technical field [0001] The invention relates to the technical field of resource treatment of waste tantalum capacitors, in particular to a method for preparing visible light-responsive tantalum oxynitride photocatalytic materials by using waste tantalum capacitors. Background technique [0002] At present, semiconductor photocatalysts are widely used in organic matter degradation, water treatment, air purification, etc. However, many chemically stable and excellent semiconductors often have a wide band gap and can only absorb ultraviolet light in the region, which only accounts for 4% of sunlight. Therefore, the development of high-efficiency photocatalysts with visible light response has important theoretical significance and practical value. The band gap of TaON is relatively narrow (2.5eV), it is stable during the photocatalytic reaction, and can release hydrogen and oxygen simultaneously in a solution containing a suitable electron donor and acceptor. Moreover, the conducti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B21/082B01J27/24C01B3/04
CPCB01J27/24C01B3/042C01B21/0821C01P2006/80Y02E60/36
Inventor 许振明牛博陈振洋
Owner SHANGHAI JIAO TONG UNIV
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