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A preparation method of force-responsive photonic crystal material based on reverse imprint nano-molding technology

A nano-molding technology and photonic crystal technology, which is applied in the field of preparation of force-responsive photonic crystal materials, can solve the problems of difficulty in preparing nano-scale photonic crystals, limited precision of photonic crystals, poor structure controllability, etc., and achieve shortening The effect of preparation cycle, short preparation cycle, and reduction of preparation cost

Active Publication Date: 2017-11-07
SHANDONG UNIV OF SCI & TECH
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Problems solved by technology

Therefore, it is difficult to prepare nanoscale photonic crystals by laser holographic interferometry
[0008] In a nutshell, the existing preparation methods of force-responsive photonic crystal materials generally have the following shortcomings or deficiencies: complex process, long preparation cycle, and high cost; poor controllability

Method used

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  • A preparation method of force-responsive photonic crystal material based on reverse imprint nano-molding technology
  • A preparation method of force-responsive photonic crystal material based on reverse imprint nano-molding technology
  • A preparation method of force-responsive photonic crystal material based on reverse imprint nano-molding technology

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Embodiment 1

[0050] The preparation method of the force-responsive photonic crystal is as follows:

[0051] 1. If figure 1 As shown, the preparation steps of the quartz mother template are as follows:

[0052] (1) According to actual needs, pre-design the structural parameters of photonic crystals, mainly including: the surface structure is a hexagonal columnar lattice, the lattice period is 200nm, the diameter of the raised columns is 100nm, and the height of the raised columns is 150nm. The effective area is 20×20mm 2 .

[0053] (2) Take a piece of quartz substrate (size is 25mm×25mm), according to the structural parameters of the above photonic crystal, use electron beam lithography technology to expose the quartz substrate and the photoresist on it for 30s, and obtain a strip after development. A photoresist with a design pattern; then, use reactive ion etching technology to etch the quartz substrate and the photoresist on it for 20 minutes, in order to accurately transfer the patte...

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Abstract

The invention discloses a method for preparing a force-responsive photonic crystal material based on reverse imprint nano-molding technology, which uses electron beam lithography technology and reactive ion etching technology to etch according to pre-designed photonic crystal structure parameters A rigid template with a nanoscale pattern is used as a master template to prepare an elastic polymer soft template with an inverse nanoscale pattern, and it is used as a secondary template; high elastic gel is used as a filling material, viscoelastic polymer As a molding material, the pattern on the master template can be "replicated" into the viscoelastic polymer in a "high-fidelity" manner by reverse imprinting; and then a nanoscale, structurally controllable force-responsive Photonic crystals. Compared with the prior art, the preparation method of the present invention has the characteristics of simple process, short process, easy control of process parameters, reusable template, high product precision level, stable and reliable quality, and low cost.

Description

technical field [0001] The invention relates to a method for preparing a force-responsive photonic crystal, in particular to a method for preparing a force-responsive photonic crystal material based on reverse embossing nano-molding technology. Background technique [0002] The preparation of the force-responsive photonic crystal material is completed by filling the highly elastic gel material with excellent mechanical properties in the nanoscale photonic crystal lattice gap. Through mechanical stretching or compression, the highly elastic polymeric network structure will increase or decrease the lattice spacing of photonic crystals, resulting in changes in diffraction wavelength and structural color, and realize the transformation of physical deformation into optical performance changes. Sensing function. [0003] Studies have shown that the multilayer structure composed of highly elastic gel and viscoelastic polymer with nanoscale photonic crystal structure has good mecha...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/00
CPCG02B1/005
Inventor 王清张睿郑旭马立俊张艳菊张星远杜文全
Owner SHANDONG UNIV OF SCI & TECH
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