Preparation methods of three-dimensional LiMn2O4 thin film positive electrode and three-dimensional all-solid-state thin film lithium ion battery
A lithium-ion battery and positive electrode technology, which is applied in the field of all-solid-state thin-film lithium-ion batteries, can solve the problems of morphology control and mass production, difficulty in maintaining three-dimensional nanostructures, difficulty in uniform deposition of positive electrode materials, etc., and achieve excellent rate performance And cycle stability, increase the electrochemical reaction area, improve the effect of electrochemical performance
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Embodiment 1
[0029] Embodiment 1: Three-dimensional LiMn 2 o 4 A method for preparing a thin film positive electrode, comprising
[0030] (1) LiMn with excess Li 2 o 4 The material is used as the target material, the stainless steel foil coated with metal layer is used as the substrate, and the magnetron sputtering vacuum chamber is evacuated to 6×10 -5 Pa, heat the substrate to 300°C, feed 36sccm argon and 4sccm oxygen, and adjust the gas pressure in the chamber to 1Pa;
[0031] (2) Set the DC sputtering power to 4.3W / cm 2 , the target base distance is 80mm, and the pre-sputtering is 10min to clean the impurities on the target surface. The sputtering time is 3h, and the three-dimensional LiMn can be directly obtained on the substrate. 2 o 4 film.
[0032] (3) The three-dimensional LiMn obtained above 2 o 4 Thin film annealing treatment, annealing temperature 700°C, annealing time 2h.
[0033] figure 1 It is a three-dimensional LiMn sputtered directly at 300 °C 2 o 4 SEM image...
Embodiment 2
[0041] This embodiment provides a LiMn for three-dimensional all-solid-state ion battery 2 o 4 The anode material is obtained by directly sputtering with a DC power source to obtain a three-dimensional anode film with a thickness of 1.3 μm.
[0042] Preparation method: (1) LiMn with excess Li 2 o 4 The material is used as the target, the stainless steel foil coated with gold layer is used as the substrate, and the magnetron sputtering vacuum chamber is evacuated to 6×10 -5 Pa, heat the substrate to 300°C, feed 36sccm argon and 4sccm oxygen, and adjust the gas pressure in the chamber to 1Pa;
[0043] (2) Set the DC sputtering power to 4.3W / cm 2 , the target base distance is 80mm, and the pre-sputtering is 10 minutes to clean the impurities on the target surface. The sputtering time is 3h, and the three-dimensional LiMn can be directly obtained on the substrate. 2 o 4 film;
[0044] (3) The three-dimensional LiMn obtained above 2 o 4 Thin film annealing treatment, annea...
Embodiment 3
[0049] This embodiment provides a LiMn for three-dimensional all-solid-state ion battery 2 o 4 The anode material is obtained by directly sputtering with a DC power source to obtain a three-dimensional anode film with a thickness of 1.3 μm.
[0050] Preparation method: (1) LiMn with excess Li 2 o 4 The material is used as the target, the stainless steel foil coated with gold layer is used as the substrate, and the magnetron sputtering vacuum chamber is evacuated to 6×10 -5 Pa, heat the substrate to 300°C, feed 36sccm argon and 4sccm oxygen, and adjust the gas pressure in the chamber to 1Pa;
[0051] (2) Set the DC sputtering power to 4.3W / cm 2 , target base distance 80mm, pre-sputtering for 10 minutes to clean the impurities on the target surface, sputtering time is 2h, then adjust the temperature to 600°C, sputtering time 1h, other conditions remain unchanged, can be obtained directly on the substrate 3D LiMn 2 o 4 film.
[0052] (3) The three-dimensional LiMn obtaine...
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