Solar cell back passive film layer structure and preparation method thereof
A solar cell and film structure technology, applied in the field of solar cells, can solve the problems of restricting cell efficiency, optical and electrical losses on the back surface of cells, etc., and achieve the effects of improving conversion efficiency, increasing costs, and good technical effects
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Embodiment 1
[0031] Aluminum oxide film 2 has a film thickness of 10nm and a refractive index of 1.55;
[0032] The first silicon nitride film 3 has a film thickness of 40nm and a refractive index of 1.90;
[0033] The second silicon nitride film 4 has a film thickness of 40nm and a refractive index of 1.90;
Embodiment 2
[0035] Aluminum oxide film 2 has a film thickness of 15nm and a refractive index of 1.60;
[0036] The first silicon nitride film 3 has a film thickness of 50nm and a refractive index of 2.05;
[0037] The second silicon nitride film 4 has a film thickness of 50 nm and a refractive index of 1.95;
Embodiment 3
[0039] Aluminum oxide film 2 has a film thickness of 30nm and a refractive index of 1.65;
[0040] The first silicon nitride film 3 has a film thickness of 90 nm and a refractive index of 2.15;
[0041] The second silicon nitride film 4 has a film thickness of 90nm and a refractive index of 2.05;
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