Secondary-coupling microwave plasma reforming device
A technology of microwave plasma and microwave plasma, which is applied in the field of plasma, can solve the problems of large influence on the impedance of the reaction chamber and difficult impedance matching, and achieve the effect of suppressing mixed-mode interference and high tolerance
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[0044] The present invention will be further described in detail below in conjunction with the accompanying drawings, so that those skilled in the art can implement it with reference to the description.
[0045] Such as figure 1 As shown, the secondary coupling microwave plasma reforming device provided by the present invention includes: a microwave plasma reaction chamber 1001 , a cylindrical resonator 1002 , a plasma reaction tube 1003 , a coupling device 1004 , and an ignition electrode 1005 .
[0046] Wherein, the cavity of the reforming device is a hollow cylindrical cavity placed vertically, surrounded by a circular waveguide 1007 with a rectangular cross section at the center of the cavity, and the circular waveguide 1007 divides the hollow cylindrical cavity into two parts, The ring waveguide 1007 and the outer wall 1006 of the cylindrical cavity form a microwave plasma annular reaction cavity 1001, and the ring waveguide 1007 itself forms a smaller cylindrical resonan...
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