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Dual-wavelength optical system and plasma flow field electron number density measuring method

A technology of electron number density and plasma, which is applied in the field of optical detection, can solve the problems that the measurement of electron number density has not been well solved, and achieve the effect of improving measurement accuracy and precision and avoiding additional errors

Inactive Publication Date: 2016-07-20
NANJING UNIV OF INFORMATION SCI & TECH
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Problems solved by technology

[0003] However, the measurement of the electron number density of such high-temperature complex flow fields with temperatures as high as thousands of degrees or even tens of thousands of degrees, which is unstable in time and non-uniform in space has not been well solved so far.

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  • Dual-wavelength optical system and plasma flow field electron number density measuring method
  • Dual-wavelength optical system and plasma flow field electron number density measuring method
  • Dual-wavelength optical system and plasma flow field electron number density measuring method

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Embodiment Construction

[0028] In order to make the objectives, technical solutions, and advantages of the present invention clearer, the following further describes the present invention in detail with reference to the accompanying drawings and embodiments. Unless otherwise specifically and clearly described in the context, the number of elements and components in the present invention may exist in a single form or in multiple forms, and the present invention does not limit this. Although the steps in the present invention are arranged with labels, they are not used to limit the order of the steps. Unless the order of the steps is clearly stated or the execution of a step requires other steps as a basis, the relative order of the steps can be adjusted. It can be understood that the term "and / or" as used herein refers to and encompasses any and all possible combinations of one or more of the associated listed items.

[0029] Unless otherwise specifically and clearly described in the context, the number ...

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Abstract

The invention provides a dual-wavelength optical system. The dual-wavelength optical system comprises a detection light source assembly, a plasma flow field, a moire fringe generation assembly, a first image sensor, a second image sensor and a synchronous outer trigger. The detection light source assembly provides a first light beam and a second light beam having a first wavelength and a second wavelength respectively, wherein the first light beam and the second light beam pass through the plasma flow field and form a first moire fringe and a second moire fringe in the moire fringe generation assembly respectively; the first image sensor and the second image sensor are electrically connected with the synchronous outer trigger, and record the first moire fringe and the second moire fringe respectively; and the synchronous outer trigger receives and calculates electron number density of the plasma flow field according to the first moire fringe and the second moire fringe. The invention also provides a plasma flow field electron number density measuring method.

Description

【Technical Field】 [0001] The invention belongs to the technical field of optical detection, and specifically relates to a dual-wavelength optical system and a method for measuring the electron number density based on the plasma flow field of the dual-wavelength optical system. 【Background technique】 [0002] 3-D full-field display of flow physical phenomena and structures in high-temperature complex flow fields, accurate measurement of temperature and gas composition, and electron number density. Design and development of aircraft, material selection, measurement and control, guidance, warning, and ground interaction Communication issues are particularly basic and critical. In addition to its universality in modern aviation, aerospace and military, it also has a wide range of industrial and civil applications, such as: energy engineering, high-temperature cutting, processing, welding, surface treatment and smelting. [0003] However, the electron number density measurement of such...

Claims

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Application Information

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IPC IPC(8): G01M9/06
CPCG01M9/06
Inventor 陈云云赵德林钟霞胡永正
Owner NANJING UNIV OF INFORMATION SCI & TECH
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