Optical component and timepiece

A technology for optical components and clocks, applied in optical components, clocks, optics, etc., can solve the problems of poor productivity and high production costs of optical components, and achieve the effect of simple structure

Inactive Publication Date: 2016-06-15
SEIKO EPSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, conventionally, since each layer constituting the anti-reflection film is formed by a vapor phase film forming method, the productivity of optical components is poor, and the production cost is also high.

Method used

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  • Optical component and timepiece
  • Optical component and timepiece
  • Optical component and timepiece

Examples

Experimental program
Comparison scheme
Effect test

no. 1 Embodiment approach

[0036] figure 1 It is a cross-sectional view schematically showing the first embodiment of the optical component of the present invention. figure 2 It is a figure which shows typically an example of the particle size distribution of the silica particle which comprises the anti-reflection film of the optical component of this invention.

[0037] Such as figure 1 As shown, the optical component P10 of this embodiment includes a base material P1 and an anti-reflection film P2 containing silica particles P21.

[0038] In addition, the silica particles P21 contained in the anti-reflection film P2 have a predetermined particle size distribution.

[0039] That is, the silica particles P21 contained in the anti-reflection film P2 have the first maximum value MV1 in the range of 1.5 nm to 2.5 nm (the first range R1) in the number-based particle size distribution, which is at 3.5 nm There is a second maximum value MV2 in the above 4.5nm range (second range R2), and a third maximum value MV3 i...

no. 2 Embodiment approach

[0104] image 3 It is a cross-sectional view schematically showing the second embodiment of the optical component of the present invention. In the following description, differences from the above-mentioned embodiment will be mainly described, and description of the same matters will be omitted.

[0105] Such as image 3 As shown, the optical component P10 of this embodiment includes a substrate P1, an anti-reflection film P2 containing silica particles P21, and a base layer P3.

[0106] By having the base layer P3 in this way, for example, the close adhesion between the base material P1 and the anti-reflection film P2 (adherence via the base layer P3) can be particularly excellent, and the durability and reliability of the optical component P10 can be particularly excellent . As the constituent material of the base layer P3, for example, various resin materials, SiO 2 Wait.

[0107] The thickness of the base layer P3 is not particularly limited, but it is preferably 5 nm or more a...

Embodiment 1

[0176] The glass cover which is an optical component is manufactured by the method shown below.

[0177] First, a plate (glass plate) made of sapphire glass is prepared as a base material (base material preparation step), and necessary parts are cut and polished. The base material after cutting and grinding is approximately disc-shaped, with a size of diameter: 30 mm × thickness: 1 mm.

[0178] Next, the surface of the base material on the side where the anti-reflection film is to be formed is subjected to an ultraviolet irradiation treatment to irradiate ultraviolet rays with a wavelength of 248 nm.

[0179] Next, the composition for forming an anti-reflection film is applied to the entire one surface of the substrate by a spraying method (the composition applying step for forming an anti-reflection film).

[0180] As a composition for forming an anti-reflection film, tin oxide (SnO) which is a mixture of silica particles and conductive particles (conductive transparent metal oxide p...

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Abstract

An optical component includes a base material and an antireflection film containing silica particles, wherein the silica particles have a first local maximum in the range of 1.5 nm or more and 2.5 nm or less (a first range), a second local maximum in the range of 3.5 nm or more and 4.5 nm or less (a second range), and a third local maximum in the range of 7.5 nm or more and 8.5 nm or less (a third range) in a number-based particle size distribution. It is preferred that the silica particles have a fourth local maximum in the range of 5.5 nm or more and 6.5 nm or less in the number-based particle size distribution(a fourth range).

Description

Technical field [0001] The present invention relates to optical components and timepieces. Background technique [0002] In optical parts such as timepiece glass covers, for the purpose of improving visibility on the opposite surface side, an anti-reflection film is provided to prevent light reflection. [0003] Conventionally, in order to obtain a sufficient anti-reflection function, there is an optical component having a complicated structure in which a plurality of layers are laminated (for example, refer to Patent Document 1). In addition, in the past, since the layers constituting the anti-reflection film were formed by the vapor phase film formation method, the productivity of the optical component was poor and the production cost was also high. [0004] Patent Document 1: Japanese Patent Application Publication No. 2010-37115 Summary of the invention [0005] The object of the present invention is to provide an optical component provided with an anti-reflection film having an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/115G04B39/00C03C17/23
CPCC03C17/23G02B1/115G04B39/002C03C2217/213B82Y30/00G04B39/006Y10S977/773G02B2207/107G02B1/113G02B1/118
Inventor 古里大喜铃木克己
Owner SEIKO EPSON CORP
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