Manufacturing method for aluminum targets
A manufacturing method and aluminum target technology, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems that cannot meet the use requirements of high-generation TFT-LCD panels
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[0027] The existing manufacturing method of aluminum target usually requires three heat treatments. However, when the existing heat treatment methods are aimed at the aluminum targets above the 6th generation line, they often cannot meet the corresponding processing requirements. This is because the size of the aluminum target used in the TFT-LCD panel above the 6th generation line is relatively large, and it is often difficult to control the temperature uniformity of the aluminum target in the heat treatment furnace. For example, the aluminum target area of the 8.5-generation line is 2650mm×210mm. In the existing matching heat treatment furnace, the temperature transmitted from the furnace temperature to the various directions of the aluminum target is often different. In addition, for TFT-LCD panels above the 6th generation line, when forming aluminum wiring on the glass substrate, it is necessary to use multiple aluminum targets at the same time to sputter together. For ...
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