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Manufacturing method of large-area total focusing type double curvature bent crystals

A technology of curved crystals and manufacturing methods, which is applied in the field of large-area full-focus double-curvature curved crystals. It can solve the problems of forced cooling and maintenance of instruments, focus point astigmatism, waste of electric energy, etc., and achieve the improvement of diffraction efficiency and the miniaturization of instruments. , the effect of cost reduction

Inactive Publication Date: 2016-05-11
CHINA TEST & CERTIFICATION INT GRP CO LTD
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  • Application Information

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Problems solved by technology

Disadvantages: non-strict focus, focus point F has astigmatism
However, it is difficult for ordinary laboratories to meet these conditions. Even if the X-ray power is simply increased, a large amount of electric energy will be wasted, which will cause a series of problems such as forced cooling of the instrument and complicated maintenance.

Method used

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  • Manufacturing method of large-area total focusing type double curvature bent crystals
  • Manufacturing method of large-area total focusing type double curvature bent crystals
  • Manufacturing method of large-area total focusing type double curvature bent crystals

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Embodiment

[0043] Embodiment: a kind of manufacturing method of large-area all-focus type double-curvature curved crystal is characterized in that it comprises the following steps:

[0044] 1. Rowland circle direction: if Figure 4

[0045] (1) Processing center wafer 2:

[0046] In the first step, the surface of the crystal blank is ground to be parallel to the crystal plane; in the second step, a 2R concave arc surface is ground on the crystal surface, and the center of the arc surface is point A; in the third step, along the direction parallel to the 2R surface, remove the Crystal slice; the fourth step is to align the center point A of the crystal slice with the position corresponding to the center point A on the Rowland circle of the wafer, continue to bend the crystal slice, and finally bend the radius of curvature of the inner surface of the crystal slice to R;

[0047] (2) Processing wafers 3 on both sides of the central wafer:

[0048] In the first step, according to the size...

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Abstract

The invention provides a manufacturing method of large-area total focusing type double curvature bent crystals. The manufacturing method is characterized by comprising the following steps that step one, in a Rowland circle direction: (1) a center chip is processed and manufactured; (2) chips of the two sides of the center chip are processed and manufactured; and step two, in an arc surface direction perpendicular to the Rowland circle: rotating radius r bending is performed on all the covering crystals in the Rowland circle direction completely manufactured in the step 1 in the original position along an optical axis formed by an incident focus S and an emergent focus F so that the double curvature bent crystals are formed. The beneficial effects of the manufacturing method of the large-area total focusing type double curvature bent crystals are that total focusing crystal diffraction can be realized in two directions in a segmented way by using a simple and feasible processing method of small crystals so that the large-area double curvature bent crystals on the designed total focusing curved surface can be realized and more incident intensity can be collected; and X-ray monochromatization and crystal light splitting in wavelength dispersion X-ray fluorescence analysis can be realized by utilizing the technology so that crystal diffraction efficiency and intensity can be greatly enhanced.

Description

(1) Technical field: [0001] The present invention relates to crystal diffraction spectroscopy, that is, adopting the crystal diffraction method based on the Bragg principle to obtain high-intensity single-wavelength X-rays. This technology includes the working method of large-area diffraction crystals and the processing technology of processing into double-curvature curved all-focus crystals. , that is, a large-area all-focus double-curvature curved crystal fabrication method, which can be used for crystal spectroscopy in X-ray monochromatization and wavelength-dispersive X-ray fluorescence analysis. (two) background technology: [0002] Since the discovery of X-rays, X-ray analysis methods have developed rapidly. X-ray diffraction (XRD) can be used for material structure and phase analysis, and X-ray fluorescence (XRF) can be used for elemental composition analysis, which has been applied in many fields. has become an important analytical technique. [0003] The core of X-...

Claims

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Application Information

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IPC IPC(8): G21K1/06
Inventor 宋欣张磊付晓光李海建宋晓琨
Owner CHINA TEST & CERTIFICATION INT GRP CO LTD
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