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VPX bus-based workpiece bench synchronous motion control system and method

A technology of synchronous motion and control system, applied in the direction of using feedback control, photolithography exposure device, microlithography exposure equipment, etc., to achieve the effect of flexible network topology, high reliability, and strong real-time performance

Active Publication Date: 2016-04-20
TSINGHUA UNIV +1
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Problems solved by technology

[0004] Although the VME bus computer system has been fully affirmed in terms of reliability, stability, and scalability, the bottleneck of the traditional VME bus-based workpiece table motion control system mainly lies in the bus data throughput rate, network topology, and data processing capabilities.

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  • VPX bus-based workpiece bench synchronous motion control system and method
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  • VPX bus-based workpiece bench synchronous motion control system and method

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Embodiment Construction

[0064] The content of the specific structure and working principle of the present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0065] A kind of workpiece table synchronous motion control system based on VPX bus of the present invention, such as figure 1 , figure 2 , image 3 , Figure 4 As shown, it includes VPX bus chassis, CPU main control unit, motion control unit, optical fiber interface unit, power amplifier unit, motor driver unit, measurement unit and human-computer interaction unit; the VPX chassis is provided with a 6U five-slot VPX back board, a power module and a plurality of cooling fans; the main control unit is a CPU main control card; the motion control unit includes one or two DSP motion control cards; the optical fiber interface unit includes one or two An FPGA fiber interface card; the CPU main control card, the DSP motion control card and the FPGA fiber interface card are all inserted on the V...

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Abstract

The invention relates to a VPX bus-based workpiece bench synchronous motion control system and method and belongs to the semiconductor precision mechanical equipment motion control system technical field. The motion control system includes a VPX bus chassis, a CPU main control unit, a motion control unit, an optical fiber interface unit, a power amplifier unit, a motor driving unit, a measuring unit and a man-machine interaction unit. The VPX bus-based workpiece bench synchronous motion control system of the invention can be suitable for different platforms with a large number of motor shafts, a large quantity of information, complicated control algorithms and the like. According to the control system, high-speed interconnection of a plurality of processors of the system can be realized through a RapidIO bus architecture; feedback data calculation can be completed in real time and fast through the multi-core DSP motion control unit; and communication of various paths of data can be realized through the optical fiber interface unit. Compared with the prior art, the control system not only can load complex control algorithms, but also has a flexible network topological structure, high real-time performance, high-speed data transmission ability and powerful data processing ability.

Description

technical field [0001] The invention belongs to the technical field of semiconductor equipment, and relates to a design of a VPX bus-based synchronous motion control system and method for a workpiece table. Background technique [0002] Lithography machine is the key equipment for IC manufacturing. Domestic and foreign lithography machine manufacturers such as ASML, Nikon, Canon, SMEE, and some workpiece table research institutions, Eindhoven University in the Netherlands, Philips, and domestic universities such as Tsinghua University and Huazhong University of Science and Technology, etc. Both use the VME parallel bus architecture to develop the lithography machine workpiece table control system, the most representative ones are ASML's PASSstepper, PASScanner, TWINSCANAT, TWINSCANXT and other related products. [0003] With the development and progress of the lithography machine and its lithography technology, the control system of the lithography machine workpiece table ha...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05D3/20G03F7/20
CPCG03F7/20G05D3/20
Inventor 朱煜杨开明成荣廖晨翔梁志敏付增强袁翠平王希远
Owner TSINGHUA UNIV
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