Anti-ultraviolet material, anti-ultraviolet film and preparation method of film
An anti-ultraviolet and ultraviolet technology, which is applied in epoxy resin coatings, reflective/signal coatings, radiation-absorbing coatings, etc., can solve the problems of easy aging and poor anti-ultraviolet effect, and achieve cost control, high ultraviolet reflectance and absorption rate effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0055] Dilute the thermosetting resin (main ingredient) DBD01A of Kangdexin Company with the first solvent ethyl acetate to form the first mixture, and zinc oxide with a particle size between 0.5 and 1 μm of Dongxin Chemical Company The powder is mixed with a second solvent, propylene glycol methyl ether, to form a second mixture.
[0056] The ultraviolet absorber model EV-10 of Taiwan Yongguang Company was added to the second mixture to form the third mixture.
[0057] Add the first mixture to the third mixture, and stir it into a homogenous slurry to form an anti-ultraviolet material during the addition process. The stirring speed is 2000r / min. The raw materials and contents of each component in the formed material are shown in Table 1.
[0058] The material was coated on a transparent PET substrate with a thickness of 125 μm, placed in a blast oven for 2 minutes, and the temperature in the oven was 80° C., and dried to obtain an ultraviolet-resistant film. The specific par...
Embodiment 2
[0060] Dilute the thermosetting resin (main ingredient) DBD01A of Kangdexin Company with ethyl acetate to form the first mixture, and the zinc oxide powder with a particle size between 1 and 3 μm of Dongxin Chemical Company and the second The solvent propylene glycol methyl ether is mixed to form a second mixture.
[0061] The ultraviolet absorber model EV-10 of Taiwan Yongguang Company was added to the second mixture to form the third mixture.
[0062] Add the first mixture to the third mixture, and stir to form a homogenous slurry to form an anti-ultraviolet material during the addition process. The stirring speed is 3000r / min. The raw materials and contents of each component in the formed material are shown in Table 1.
[0063] The material was coated on a transparent PET substrate with a thickness of 125 μm, placed in a blast oven for 2 minutes, and the temperature in the oven was 80° C., and dried to obtain an ultraviolet-resistant film. The specific parameters are shown...
Embodiment 3
[0065] Dilute the light-curable resin (namely the main material) of Lida Chemical Industry SA001 with the first solvent ethyl acetate to form the first mixture, and the zinc oxide powder with a particle size of 3-5 μm from Dongxin Chemical Company and The second solvent, propylene glycol methyl ether, is mixed to form a second mixture.
[0066] The ultraviolet absorber model EV-10 of Taiwan Yongguang Company was added to the second mixture to form the third mixture.
[0067] Add the first mixture to the third mixture, and stir it into a homogenous slurry to form an anti-ultraviolet material during the addition process. The stirring speed is 4000r / min. The raw materials and contents of each component in the formed material are shown in Table 1.
[0068] The material is coated on a transparent PET substrate with a thickness of 125 μm, placed in a blast oven for 1 min, the temperature in the oven is 80 ° C, and placed at 800 mJ / cm 2 In the UV conveyor, it is dried to obtain a UV...
PUM
Property | Measurement | Unit |
---|---|---|
particle diameter | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com