Circulating filtration type nuclear pore membrane etching device

Abstract

The invention discloses a circulating filtration type nuclear pore membrane etching device. The device is used for nuclear pore membrane batch etching machining and mainly applied to the fields of nuclear pore membrane product machining, nuclear pore membrane preparation and the like. The circulating filtration type nuclear pore membrane etching device is mainly characterized in that an etching groove is connected with an input port of a heating groove through a pipeline, and the pipeline is provided with a water path switch; output of the heating groove is connected with the etching groove through a circulating filtration machine, heaters are arranged in the heating groove, and a thermosensitive probe for monitoring the temperature of etching liquid for the heaters is arranged in the etching groove; a stirrer is arranged in a liquid blending groove, and the liquid blending groove is connected with the etching groove through a water path switch and a liquid addition filtration machine via a pipeline; a concentration probe for monitoring concentration in the heating groove is arranged in a liquid supply groove, and the liquid supplement groove supplies etching liquid to the etching groove automatically. The device has the advantages of automatic temperature and concentration compensation, circulating flow, self-cleaning performance and the like, and can perform nuclear pore membrane batch etching efficiently for a long time.

Description

technical field [0001] The invention relates to a batch etching device for nuclear pore membranes. This device is mainly used for batch etching processing of nuclear pore membranes, and its main application fields include nuclear pore membrane product processing, nuclear pore membrane preparation, etc. Background technique [0002] Nuclear pore membrane, also known as nuclear microporous membrane or heavy ion microporous membrane, is formed by punching holes in the insulating material film with heavy ions and then chemically etching to expand the pores. The etching process is mainly to immerse the irradiated membrane material in an alkaline etching liquid. Alkaline liquid generally adopts 2-8 mol / liter sodium hydroxide solution, and the etching temperature is generally 50-80°C. Since the pore diameter of the nuclear pore membrane is proportional to the etching time under the same etching conditions, nuclear pore membranes with different pore diameters are usually produced ...

AI Technical Summary

Problems solved by technology

[0004] (1) The nuclear pore membrane is not cleaned after etching, and there is alkaline residue

[0005] (2) During the etching process, due to the volatilization of the etching solution and other reasons, the concentration of the etching solution changes, resulting in a change in the etching rate, resulting in uneven pore size of the nuclear pore membrane

[0006] (3) The etching tank is generally heated by a heater, and the temperature changes in different areas, and the etching rate is different in different etching positions, resulting in uneven etching

[0007] (4) During the etching process, residues will be produced due to the reaction between the membrane and the etching solution, which will cause the transmission failure of the film rolling machine; at the same time, the etching solution will become turbid and adhere to the surface of the nuclear pore membrane to hinder the etching of the nuclear pore membrane, resulting in uneven etching pore size

[0009] At present, these problems still plague the etching process of nuclear pore membranes and affect the product quality of nuclear pore membranes.

Images