Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Carbon-based nanoparticle film with anti-reflection micro-nano structure and preparation method

A micro-nano structure, carbon-based nanotechnology, applied in gaseous chemical plating, metal material coating process, coating and other directions, to achieve the effect of significant thermally assisted photoelectric effect, easy multi-component coupling, and simple preparation process

Active Publication Date: 2018-04-17
SHANGHAI JIAO TONG UNIV
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these bionic remains infrared detection functional devices are all bolometric infrared detectors, and there are few reports on bionic remains infrared detection materials based on pyroelectric or photoelectric type.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Carbon-based nanoparticle film with anti-reflection micro-nano structure and preparation method
  • Carbon-based nanoparticle film with anti-reflection micro-nano structure and preparation method
  • Carbon-based nanoparticle film with anti-reflection micro-nano structure and preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] The composite solid-solution semiconductor coupled carbon-based nanoparticle film of this embodiment (marked as Cu 1.96 S-Cu 2 S@C_T_FW) preparation method, comprises the following steps:

[0052] (1) Select the forewing of Papilionaceae as the black light-absorbing butterfly wing with anti-reflection microstructure;

[0053] (2) Carry out the following pretreatment and activation treatment to the forewings of the selected Papilionidae: first, the butterfly wings are soaked in absolute ethanol for 30 minutes, and then cleaned with deionized water; then the butterfly wings are immersed in a 15vol% volume fraction HNO 3 Put it in the solution for 2 hours, take it out and wash it; then soak the butterfly wings in 40% ethylenediamine absolute ethanol solution for 6 hours, then take it out, and wash it several times with deionized water; the above steps are used to remove pigments and impurities , and improve its surface adsorption properties;

[0054] (3) Deposition of ...

Embodiment 2

[0087] The carbon-based composite Cd of the present embodiment 2 The preparation method of S nanoparticle system, comprises the following steps:

[0088] (1) Select the forewing of Papilion butterfly as the butterfly wing with anti-reflection microstructure;

[0089] (2) Carry out the following pretreatment and activation treatment to the selected Papilio forewing: first put the butterfly wing in absolute ethanol to soak for 15min, and clean it with deionized water; then dip the butterfly wing in 5vol% HNO 3 Put it in the solution for 2 hours, take it out and wash it; then soak the butterfly wings in 10% ethylenediamine absolute ethanol solution for 6 hours, then take it out, and wash it several times with deionized water; the above steps are used to remove pigments and impurities , and improve its surface adsorption properties;

[0090] (3) Deposition of Au nanoparticles: immerse the activated butterfly wings in the chloroauric acid precursor solution at a constant tempera...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
quality scoreaaaaaaaaaa
Login to View More

Abstract

The invention discloses a composite solid-solution semiconductor-coupled carbon-based nanoparticle film with an anti-reflection micro-nano structure and a preparation method thereof. The method includes selection, pretreatment and activation treatment of butterfly wings, and chemical deposition on the butterfly wings Metal / semiconductor coupled nanoparticles, vacuum carbonized butterfly wings and other steps. The method for preparing a composite solid-solution semiconductor-coupled carbon-based nanoparticle film with an anti-reflection micro-nano structure uses butterfly wings to make a composite solid-solution semiconductor nanoparticle film, and the manufacturing process is simple, safe, stable, low in cost, and energy-consuming. Low, the prepared nanoparticle film has achieved a macroscopic large-scale, and has a butterfly-wing anti-reflection microstructure. This film has high absorption and anti-reflection performance in the infrared spectrum band, and has excellent infrared photothermal conversion performance and photoelectric effect, thereby realizing infrared heat-assisted infrared detection, which can be applied to infrared photoelectricity and infrared detection.

Description

technical field [0001] The invention relates to the field of metal and semiconductor nanoparticle films, in particular to a composite solid-solution semiconductor-coupled carbon-based nanoparticle film with an antireflection micro-nano structure and a preparation method. Background technique [0002] Infrared sensing is an important technology that is widely used in energy, environmental science, medical engineering and public safety, such as energy metering, environmental pollution monitoring, remote control, thermal imaging, night vision, thermal photoelectricity, medical imaging, Optical communication, fire detection, monitoring, industrial process control, analysis and detection, etc. Most infrared detection can be divided into three categories: bolometric, pyroelectric and photoelectric infrared detection. [0003] Previously, most of the infrared sensing devices that could meet the requirements of practical applications were cooled infrared sensors. However, due to t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/06C23C16/22C23C16/56
Inventor 张旺田军龙汪万林蔡年进潘峰刘庆雷张荻
Owner SHANGHAI JIAO TONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products