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A Method for Determining Optimum Height of Workpiece Table Detector of Photolithography Machine

A determination method and photodetector technology, applied in the field of semiconductors, can solve problems such as limited resolution and long measurement time, and achieve the effects of high measurement accuracy, fewer iterations, and fast measurement speed

Inactive Publication Date: 2017-07-11
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Description
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Problems solved by technology

In this method, the shorter the sampling interval in the vertical direction, the higher the measurement resolution will be, so the number of scans in the horizontal direction will also increase, and each horizontal scan data needs to be processed, the measurement time is long, and the resolution is also high. very limited

Method used

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  • A Method for Determining Optimum Height of Workpiece Table Detector of Photolithography Machine
  • A Method for Determining Optimum Height of Workpiece Table Detector of Photolithography Machine
  • A Method for Determining Optimum Height of Workpiece Table Detector of Photolithography Machine

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Embodiment Construction

[0025] A method for determining the optimal height of the workpiece stage detector of a lithography machine according to the present invention will be further described in detail below.

[0026] figure 1 Shown is a schematic diagram of an optimal height measurement device for the photodetector of the workpiece table of the lithography machine. The exposure system of the lithography machine is provided with an illumination system, a mask 1 with a light-transmitting area, a projection objective lens 2 and a workpiece table 3 in sequence along the optical axis. The illumination system illuminates the mask 1 and images it on the workpiece table through the projection objective lens 2. The photodetector 4 is installed on the workpiece table. The workpiece table can perform three-dimensional scanning and drive the photodetector to detect the transmitted light intensity signal.

[0027] for figure 1 Shown device, application of the present invention determines the method for photod...

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Abstract

The invention discloses a method for determining the optimal height of a workpiece table detector of a lithography machine. The workpiece table carries a photodetector to detect the light intensity along the direction of the optical axis at a specific light intensity position, and iteratively finds the minimum value of the light intensity. The corresponding position is the optimum height of the detector. The method controls the sampling interval of the workpiece table along the optical axis, so that the measurement accuracy can reach the micron level, and the measurement method is simple and fast, and the measurement accuracy is high.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a method for determining the optimum height of a workpiece table detector of a lithography machine. Background technique [0002] In the exposure system of a lithography machine, the characteristics of the system, such as stray light, field size, and uniformity of the field of view, have an impact on the imaging quality and resolution of the lithography machine, and testing and evaluation are required. In order to ensure measurement accuracy, Measurements need to be made near the best focal plane on the mask surface or silicon wafer surface, so it is necessary to determine the optimum detection height of the photodetector on the mask surface or silicon wafer surface. [0003] Patent CN 102402139 A provides a method for determining the optimum height of the photoelectric sensor of the workpiece table of a lithography machine, and compares the advantages and disadvantages of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 刘卫静廖志杰邢廷文林妩媚
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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