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Field-effect transistor and manufacturing method thereof and display

A field-effect transistor and semiconductor technology, which is applied in the direction of transistors, electric solid-state devices, semiconductor devices, etc., can solve the problems of large threshold voltage, unfavorable research and development of field-effect transistors, high energy consumption of field-effect transistors, etc. state voltage, lower threshold voltage, and lower power

Inactive Publication Date: 2015-09-30
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
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  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the prior art, the structure of field effect transistors, especially thin film transistors, has a relatively large limit on the threshold voltage of field effect transistors, making the threshold voltage larger
A large threshold voltage will cause the field effect transistor to consume more energy during use, which is very unfavorable for the research and development of the field effect transistor

Method used

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  • Field-effect transistor and manufacturing method thereof and display
  • Field-effect transistor and manufacturing method thereof and display
  • Field-effect transistor and manufacturing method thereof and display

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Embodiment Construction

[0027] The present invention will be further described below with reference to the accompanying drawings.

[0028] It should be understood that “upper” and “lower” mentioned here are relative directions. Compared to the semiconductor layer 50 , one side of the first gate layer 20 is the lower side, and the second gate layer 70 is the lower side. One side is the upper side. In addition, the "vertical direction" referred to here is the direction from the first gate electrode layer 20 to the second gate electrode layer 70, or the opposite direction. The "projection along the vertical direction" refers to the projection on the plane where the first gate layer is located, or on a surface parallel to the plane where the first gate layer is located.

[0029] Figure 1 to Figure 7 The manufacturing process of the field effect transistor 100 of the present invention is schematically shown. The manufacturing method of the field effect transistor 100 is as follows.

[0030] like fig...

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Abstract

The invention relates to a field-effect transistor and a manufacturing method thereof and a display. The field-effect transistor comprises a source, a drain, a semiconductor layer, a first gate layer and a second gate layer; the semiconductor layer is disposed between the source and the drain; the first gate layer is disposed on one side of the semiconductor layer; the second gate layer is disposed on the other side of the semiconductor layer. The field-effect transistor is lower in energy consumption. The manufacturing method of the field-effect transistor is lower in cost. The display using the field-effect transistor is lower in energy consumption.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a field effect transistor. Background technique [0002] Liquid crystal display technology is a technology that is highly developed and highly valued today. As the cornerstone of the information industry, it involves a wide range of technologies and a strong industrial driving force, and is an important manifestation of the country's industrialization capabilities and competitiveness. The field effect transistor is one of the most important structures in the display, so its structure and manufacturing process are one of the key research objects in the field of display technology. [0003] In the prior art, the structure of the field effect transistor, especially the thin film transistor, has a relatively large limit on the threshold voltage of the field effect transistor, so that the threshold voltage is relatively large. A larger threshold voltage will cause the field...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/786H01L29/423H01L21/28H01L29/66
CPCH01L29/401H01L29/42356H01L29/66484H01L29/78648H01L29/66742Y02E10/549Y02P70/50H10K10/482H10K10/484H10K19/10H10K77/111H01L29/42384H01L29/78696
Inventor 徐洪远萧祥志苏长义
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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