Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Substrate, mask plate, display device and alignment method

A technology for mask plates and substrates, which is applied in the fields of mask plates, display devices, substrates, and alignment, and can solve problems such as time-consuming and affecting the exposure machine’s embedding rate.

Inactive Publication Date: 2015-07-29
HEFEI BOE OPTOELECTRONICS TECH +1
View PDF9 Cites 24 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the differences between these three types of alignment marks are small, when the exposure machine uses one of the above-mentioned alignment marks for alignment, it is easy to confuse it with the other two types of alignment marks. position, the exposure machine sends out a registration error report, and cannot continue to work, and needs to wait for manual debugging, and the manual debugging process takes a long time, which affects the marriage rate of the exposure machine

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate, mask plate, display device and alignment method
  • Substrate, mask plate, display device and alignment method
  • Substrate, mask plate, display device and alignment method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] An embodiment of the present invention provides a substrate, such as figure 2 As shown, the substrate is provided with a first common mark 22, and the first common mark 22 is used for alignment when using the same mask to make the first film layer and the second film layer with the same pattern but not overlapping; During the first film layer, the first common mark 22 is aligned with the second common mark 24 on the mask plate, specifically as figure 2 As shown, the alignment between the mask plate and the substrate is completed; when making the second film layer, on the basis of the alignment of the first common mark 22 and the second common mark 24, the deviation correction function of the patterning equipment is used to realize the second film The pattern deviation between the layer and the first film layer completes the alignment between the mask plate and the substrate, and the second common mark 24 on the mask plate corresponds to the first common mark 22 .

[...

Embodiment 2

[0058] This embodiment provides a mask plate, such as figure 2 As shown, the mask plate is provided with a second common mark 24, and the second common mark 24 is used for alignment when using the mask plate to make the first film layer and the second film layer with the same but non-overlapping graphics; During the first film layer, the second common mark 24 is aligned with the first common mark 22 of the substrate to complete the alignment between the mask plate and the substrate; On the basis of alignment, the pattern deviation between the second film layer and the first film layer is realized by using the deviation correction function of the patterning equipment, and the alignment between the mask plate and the substrate is completed, and the first common mark 22 of the substrate is aligned with the second common mark 24. correspond.

[0059] The mask plate provided in this embodiment is used in conjunction with the substrate provided in Embodiment 1, mainly because the ...

Embodiment 3

[0063] An embodiment of the present invention provides a display device, in which the substrate described in Embodiment 1 is used in the manufacturing process. Referring to the specific example of preparing the color filter layer of the color filter substrate described in the first embodiment, it can be seen that during the preparation process of the display device provided by this embodiment, the probability of misalignment of the patterning equipment is low, so this embodiment provides Display devices with higher yields in fabrication.

[0064]The display device provided by the embodiment of the present invention may be any product or component with a display function such as a liquid crystal panel, electronic paper, a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, and a navigator.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a substrate, a mask plate, a display device and an alignment method, which relate to the display field, and can be beneficial to reduction of the probability of alignment errors occurring during the working process of a picture composition device, so that the activation of the device is improved. The invention provides the alignment method applicable to utilizing the same mask plate to form a first film layer and a second film layer with same graphs but not coincident on the same substrate. The alignment method comprises the following steps of when manufacturing the first film layer, aligning a first public sign and a second public sign to finish alignment of the mask plate and the substrate, wherein the first public sign is arranged on the substrate, and the second public sign is arranged on the mask plate and corresponds to the first public sign; when manufacturing the second film layer, firstly aligning the first public sign and the second public sign, then utilizing a deviation supplement and correct function of the picture composition device to realize graph deviation of the second film layer and the first film layer, and finishing alignment of the mask plate and the substrate. The invention is used for improving the design of alignment signs on the substrate.

Description

technical field [0001] The invention relates to the display field, in particular to a substrate, a mask plate, a display device, and an alignment method. Background technique [0002] In the prior art, when a proximity exposure machine is used to manufacture a color filter substrate, alignment marks of the color filter layer are generally formed during the process of manufacturing a black matrix. The color film layer includes a red color film layer, a green color film layer and a blue color film layer, so as figure 1 As shown, the alignment marks of the color filter layer also include three sets correspondingly, which are respectively used for the alignment process during the production of the three color filter layers. The blue alignment mark 1 in the figure is the alignment mark used when making the blue color film layer, the green alignment mark 2 is the alignment mark used when making the green color film layer, and the red alignment mark 3 is the alignment mark used wh...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/42G02F1/1335
CPCG03F1/42
Inventor 张鹏飞骆意勇
Owner HEFEI BOE OPTOELECTRONICS TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products