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Large-discharge-interval normal temperature glow discharge low-temperature plasma material processing device

A low-temperature plasma and glow discharge technology, applied in the direction of plasma, electrical components, etc., to achieve the effect of low vacuum degree requirements

Inactive Publication Date: 2015-07-08
NANJING SUMAN PLASMA TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The technical problem to be solved by the present invention is to provide a low-temperature plasma material treatment device for glow discharge at room temperature with a large discharge distance in view of the defects of the prior art. A large number of thermal energy problems, a material processing device that can generate uniform glow discharge and glow discharge low-temperature plasma close to room temperature under the pressure of 500~5000pa

Method used

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Embodiment 1

[0038] figure 1 It is an embodiment of the patent of the present invention. In order to prevent the electrodes and the vacuum cavity wall from discharging, the cavity wall of the vacuum cavity 1 in this embodiment adopts an insulating cavity wall 2, and the insulating material of the insulating cavity wall 2 can be ceramics, glass , polyethylene, polyvinyl chloride, polypropylene, polytetrafluoroethylene, nylon and other materials. The right side of the vacuum chamber body 1 is a vacuum chamber door 6, which can be made of tempered glass, and a sealing ring 5 is arranged between the vacuum chamber door 6 and the chamber body. The lower cavity wall is provided with an air extraction and deflation interface 7, and the upper cavity wall is provided with an external atmosphere interface 8. The upper electrode 9 and the lower electrode 15 are arranged in the vacuum chamber 1 opposite to each other. The upper electrode 9 is connected to the (+) end of the differential modulation pu...

Embodiment 2

[0044] figure 2 It is the second embodiment of the present invention. The cavity wall of the vacuum cavity 1 in this embodiment is a metal cavity wall 3. In order to prevent the electrodes and the metal cavity wall 3 from discharging, the inner surface of the metal cavity wall 3 is covered There is an insulating layer 4, and the metal cavity wall insulating layer 4 has adopted materials such as glass, polyethylene, polypropylene, nylon, polytetrafluoroethylene, silicon rubber and the like. The other structure of this embodiment is the same as that of Embodiment 1, and its operation method is also the same as that of Embodiment 1 during specific implementation. This embodiment is suitable for equipment with a relatively large volume of the vacuum cavity 1 .

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Abstract

The invention discloses a large-discharge-interval normal temperature glow discharge low-temperature plasma material processing device. The large-discharge-interval normal temperature glow discharge low-temperature plasma material processing device comprises a vacuum cavity, an upper electrode, a lower electrode, an outer air adding connector, an air exhaust and leakage connector and a vacuum cavity door, and further comprises a driving power source, wherein the upper electrode and the lower electrode are arranged inside the vacuum cavity, the outer air adding connector is arranged at the upper end of the vacuum cavity, the air exhaust and leakage connector is arranged at the lower end of the vacuum cavity, the vacuum cavity door is arranged on one side of the vacuum cavity, the driving power source penetrates through the vacuum cavity and are connected with the upper and lower electrodes, and the driving power source is a modulation pulse driving power source. Meanwhile, the lower surface of the upper electrode and the upper surface, opposite to the lower surface of the upper electrode, of the lower electrode are each provided with a rare earth element oxide coating. In order to solve the problem that a large amount of heat energy is generated during discharging of an existing low-temperature plasma material processing device, the normal temperature glow discharge low-temperature plasma material processing device is provided for generating uniform glow discharge and being close to the normal temperature on the condition of air pressure being 500-5000 pa.

Description

technical field [0001] The invention discloses a low-temperature plasma material processing device for glow discharge at room temperature under a large discharge distance, and relates to the technical field of low-temperature plasma material processing. Background technique [0002] The low-temperature plasma generated by gas discharge contains a large number of active particles of various types. These active particles can cause etching, oxidation, reduction, cross-linking, polymerization, grafting and other reactions on the surface of the material in contact with the material, causing the surface of the material to Changes in chemical composition and physicochemical properties. This surface treatment method has the characteristics of simple process, easy operation, low energy consumption, and no pollution to the environment. Especially in the medical materials industry, this method is used for etching activation, graft modification, polymerization or deposition coating, et...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24
Inventor 万京林万良淏万良庆
Owner NANJING SUMAN PLASMA TECH CO LTD
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