Graphene nano-electronical appliance and preparation method thereof
An electronic device and graphene technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, nanotechnology, etc., can solve the problems that cannot meet the needs of nanoelectronic device processing, graphene multilayer superposition of metal ions, and uncontrollable nanometer size, etc. problems, to achieve the effect of good consistency, large grain size and wide application range
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[0032] In one embodiment of the present invention, the preparation method of graphene nanoelectronic device comprises:
[0033] Step S1 , providing a substrate 10 . The upper surface 11 of the substrate 10 may be formed of an insulating dielectric material. A four-inch or larger wafer can also be selected as the insulating dielectric substrate 10 . The preparation method of the graphene nano-electronic device provided by the present invention does not have too much selectivity for the substrate material, and either an insulating dielectric substrate or a substrate of other materials, such as a conductive material, can be used as the substrate. The insulating dielectric substrate 10 can be a dielectric substrate such as wafer high-resistance or low-resistance silicon wafer, quartz wafer, sapphire wafer, silicon nitride wafer, silicon carbide wafer, lanthanum aluminate, gallium nitride, aluminum nitride, diamond wafer, etc. , it can also be a thin-film dielectric layer (such a...
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