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A kind of gas etching alignment method and equipment

An alignment and equipment technology, applied in optics, instruments, nonlinear optics, etc., can solve problems affecting the quality of glass panels, and achieve the effect of controlling liquid crystal alignment and avoiding surface particles

Active Publication Date: 2018-08-14
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

like figure 1 As shown, in the previous Rubbing (rubbing) alignment technology, rubbing cloth 1 (rubbing cloth) and alignment film 2 will inevitably produce particle 3 (particles), static electricity 4 and scratches 5 after rubbing, which greatly affects the glass. The quality of the panel, in order to eliminate the influence of the above factors, this paper proposes a non-contact alignment method - air etching alignment method and the special equipment used

Method used

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  • A kind of gas etching alignment method and equipment
  • A kind of gas etching alignment method and equipment
  • A kind of gas etching alignment method and equipment

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Embodiment Construction

[0026] The present invention will be further described below with reference to the accompanying drawings.

[0027] Such as figure 2 As shown, the gas etching alignment equipment provided by the embodiment of the present invention includes a platform 10 for carrying a glass substrate 30 for operation; a spray gun 20 is arranged above the platform 10, and a plurality of nozzles 21 are evenly arranged side by side on the spray gun 20 , the nozzle 21 is aimed at the glass substrate 30, and an alignment film 40 is formed on the glass substrate 30; a high-pressure air injection system 50 is connected to the spray gun 20 for providing high-pressure airflow to the spray gun 20; a moving system 60 is also included for driving the platform 10 to move , so that the platform 10 and the spray gun 20 are relatively moved, so that under the use of high-pressure air flow, the alignment film 40 will produce grooves (see image 3 ). In this embodiment, according to the needs of the grooving,...

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Abstract

Disclosed is a device for gas etching alignment, which comprises a platform (10) used for carrying a glass substrate (30); a spray gun (20) arranged above the platform (10) and aligned with the glass substrate (30); a high-pressure gas spraying system (50) used for providing a high-pressure gas flow for the spray gun (20); and a movement system (60) used for driving the platform (10) or the spray gun (20) so that the platform (10) and the spray gun (20) move relative to each other. Also provided is a method for gas etching alignment in conjunction with the above-mentioned device, which comprises the following steps: aligning the spray gun (10) with an alignment film (40), and adjusting an included angle between the spray gun (20) and the alignment film (40) to a pre-set angle (θ); starting the high-pressure gas spraying system (50), adjusting the gas pressure, and performing gas etching when the gas pressure is greater than a critical value of etching pressure (x).

Description

technical field [0001] The invention relates to the field of alignment film processing in the production process of liquid crystal display screens, in particular to the method and equipment used for alignment by air engraving. Background technique [0002] In the production process of liquid crystal display, the quality of alignment film processing also determines the quality of the display. Such as figure 1 As shown, in the previous Rubbing (rubbing) alignment technology, rubbing cloth 1 (rubbing cloth) and alignment film 2 will inevitably produce particle 3 (particles), static electricity 4 and scratches 5 after rubbing, which greatly affects the glass. The quality of the panel, in order to eliminate the impact of the above factors, this paper proposes a non-contact alignment method - air etching alignment method and the special equipment used. Due to the non-contact alignment method, on the one hand, this alignment method can effectively avoid the generation of static e...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1337G02F1/13
CPCC03C15/00
Inventor 袁履璀
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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