Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Triple-mesopore indium oxide formaldehyde gas-sensitive material and preparation method thereof

A technology of mesoporous silicon oxide and indium oxide, applied in chemical instruments and methods, nanotechnology for materials and surface science, inorganic chemistry, etc., can solve the problem of low working temperature, reduce contact, and speed up response recovery , Reduce the effect of sintering phenomenon

Active Publication Date: 2015-04-08
NINGXIA UNIVERSITY
View PDF3 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, formaldehyde gas-sensing materials with high sensitivity, good stability and low working temperature still need to be further developed.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Triple-mesopore indium oxide formaldehyde gas-sensitive material and preparation method thereof
  • Triple-mesopore indium oxide formaldehyde gas-sensitive material and preparation method thereof
  • Triple-mesopore indium oxide formaldehyde gas-sensitive material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Get 6.0g surfactant P123, 216g water and 11.8g concentrated hydrochloric acid (37.5%, the same below) mix at 35 ℃, stir 12 hours and make surfactant all dissolve and disperse evenly, then add 6g n-butanol, stir 2 After 1 hour, add 12.9g tetraethyl orthosilicate TEOS, after stirring for 24 hours, transfer to a polytetrafluoroethylene bottle, then 40 degrees of hydrothermal reaction for 1 day, after natural cooling, separate the solid and liquid by suction filtration, wash with water, Dry naturally at room temperature to obtain surfactant-containing mesoporous silica. Then, the surfactant P123 in the sample obtained above (mesoporous silica containing surfactant, the same below) was removed by calcining at 550°C in air for 6 hours to obtain ordered mesoporous silica. The obtained ordered mesoporous silica has a specific surface area of ​​691m 2 / g, pore volume 0.52cm 3 / g, the pore size is about 4.8nm.

[0033] Use 0.6g of the above-mentioned treated mesoporous silica ...

Embodiment 2

[0035] Mix 6.0g of surfactant P123, 216g of water and 11.8g of concentrated hydrochloric acid at 35°C, stir for 1-12 hours until the surfactant is completely dissolved and dispersed evenly, then add 6g of n-butanol, stir for 2 hours, then add 12.9 g of tetraethyl orthosilicate TEOS, stirred for 24 hours, transferred to a polytetrafluoroethylene bottle, followed by hydrothermal reaction at 80 degrees for 1 day, after natural cooling, solid-liquid separation by suction filtration, washing with water, and natural drying at room temperature, that is Obtained mesoporous silica containing surfactant. After the surfactant P123 in the sample obtained above was removed by calcination at 550°C in air for 6 hours, ordered mesoporous silica was obtained. The obtained ordered mesoporous silica has a specific surface area of ​​809m 2 / g, pore volume 0.66cm 3 / g, the pore size is about 6.5nm.

[0036] Use 0.6g of the above-mentioned treated mesoporous silica as a hard template, disperse i...

Embodiment 3

[0038] Mix 6.0g of surfactant P123, 216g of water and 11.8g of concentrated hydrochloric acid at 35°C, stir for 1-12 hours until the surfactant is completely dissolved and dispersed evenly, then add 16.72g of 6g of n-butanol, and stir for 2 hours, Add 12.9g tetraethyl orthosilicate TEOS, stir for 24 hours, transfer to a polytetrafluoroethylene bottle, then 100 degrees hydrothermal reaction for 1 day, after natural cooling, separate solid-liquid by suction filtration, wash with water, and dry naturally at room temperature , that is, mesoporous silica containing surfactant is obtained. After the surfactant P123 in the sample obtained above was removed by calcination at 550°C in air for 6 hours, ordered mesoporous silica was obtained. The obtained ordered mesoporous silica has a specific surface area of ​​860m 2 / g, pore volume 0.76cm 3 / g, the pore size is about 7.9nm.

[0039] Use 0.6g of the above-mentioned treated mesoporous silica as a hard template, disperse it into 10g ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
diameteraaaaaaaaaa
specific surface areaaaaaaaaaaa
Login to View More

Abstract

The invention relates to a triple-mesopore indium oxide formaldehyde gas-sensitive material and a preparation method thereof. The invention is characterized in that the formaldehyde gas-sensitive material is formed by periodically arranging indium oxide spiral nanowires in a cubic mode, wherein every two nanowires are connected through a 2-5nm-long indium oxide nanorod, the diameter of the nanowires is 4-8nm, and the formaldehyde gas-sensitive material has the mesopores with three different sizes (2-4nm, 5-8nm and 10-17nm). The material is unique, and has the mesopore distribution of three different sizes (large, medium and small), thereby being beneficial to dispersion of gas molecules and increasing the response reset rate: the triple-mesopore indium oxide is formed by periodically arranging indium oxide spiral nanowires in a cubic mode, the distribution ratio of the three kinds of mesopores can be controlled by adjusting the pore size and connectivity of the mesopore silicon oxide template and the mass ratio of the indium nitrate to the mesopore silicon oxide, and the gap between the nanowires is beneficial to the dispersion of the gas molecules, thereby increasing the response reset rate.

Description

technical field [0001] The invention relates to a triple mesoporous indium oxide gas-sensitive material and a preparation method thereof. Background technique [0002] As we all know, formaldehyde is an important chemical raw material, widely used in synthetic resins, surfactants, plastics, rubber, leather, paper, dyes, pharmaceuticals, pesticides, photographic film, explosives, building materials, as well as disinfection, fumigation and anticorrosion, etc. industry, but at the same time formaldehyde gas can strongly stimulate human mucous membranes, is carcinogenic, and is a highly toxic substance, so the effective detection of formaldehyde is particularly important. [0003] At present, the detection methods of formaldehyde gas mainly include spectrophotometry, chromatography, fluorescence, and electrochemical methods, but these methods still have some shortcomings, such as expensive equipment, complicated operation, long detection time, and inability to detect in real tim...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01G15/00B82Y30/00B82Y40/00
CPCB82Y40/00C01G15/00C01P2004/04C01P2004/16C01P2004/64C01P2006/16C01P2006/17
Inventor 赖小勇闫冰青薛屏申国鑫杨晓梅李鹏夏维涛
Owner NINGXIA UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com