Method for detecting trace elements of 8-inch polished wafer
A detection method, a technology of trace elements, applied in the direction of measuring devices, semiconductor/solid-state device testing/measurement, instruments, etc., can solve the problems affecting the performance of materials and devices, affecting the lifetime of minority carriers, defect complexation, etc., and achieve short detection time , Low detection cost, simple detection method
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[0018] Step 1: Use the polishing machine produced by Fujiyoshi to prepare an 8-inch silicon polishing sheet sample for use; Step 2: Put the 8-inch silicon polishing sheet sample into the total reflection X-ray fluorescence spectrometer; Step 3: Use the random selection method to select at least 5 test points; Step 4: sequentially detect the fluorescence intensity values of each trace element at each test point on the 8-inch silicon polished wafer by a total reflection X-ray fluorescence spectrometer, and the time for a single test point is 20 to 30 minutes.
[0019] The total reflection X-ray fluorescence spectrometer uses total reflection technology to reduce the stray background of the sample fluorescence by about 4 orders of magnitude compared with the X-ray fluorescence spectrometer, thereby greatly enhancing the energy resolution and detection sensitivity and accuracy. At the same time, Total reflection X-ray fluorescence spectrometer is a detection instrument commonly u...
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