Photoresist feeder and coater

Abstract

The invention provides a photoresist feeder. The photoresist feeder is characterized by comprising a photoresist container, a photoresist feeding system and a buffering container, wherein the buffering container is respectively communicated with the photoresist container and the photoresist feeding system by virtue of a pipeline; the photoresist in the buffering container is introduced into the photoresist container by virtue of pressure difference between the buffering container and the photoresist container; the photoresist is transmitted to the photoresist feeding system by virtue of pressure difference between the buffering container and the photoresist feeding system. The invention also provides a coater comprising the photoresist feeder.

Description

technical field [0001] The invention relates to a photoresist supply device and a coating machine. Background technique [0002] All include the step of gluing in the existing lithography process, and the purpose of gluing process is to form photoresist film on the wafer surface of lithography; Commonly used gluing method is dynamic spraying, in order to guarantee the quality of lithography process and For continuity, a supply device for supplying photoresist will be provided. For example, a common supply device includes a photoresist storage, a supply system, and a pipeline connecting the photoresist storage and the supply system. Pressurize the photoresist storage that needs to be sealed to transfer the photoresist to the supply system through the pipeline, and the photoresist storage needs to be replaced frequently to ensure the supply of colloid and to ensure the sealing; therefore, the connection between the photoresist container and the pipeline is under pressure. In...

AI Technical Summary

Problems solved by technology

Pressurize the photoresist storage that needs to be sealed to transfer the photoresist to the supply system through the pipeline, and the photoresist storage needs to be replaced frequently to ensure the supply of colloid and to ensure the sealing; therefore, the connection between the photoresist container and the pipeline is under pressure. In this case, it is necessary not only to maintain the operability of easy replacement, but also to have strong sealing and pressure bearing capacity, so the connection is easily damaged, loosened and leaked, and Low operability due to easy loss of production line capacity and handling burden on personnel

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