A projection objective lens for desktop stepper lithography machine

A technology of projection objective lens and lithography projection, which is applied in the field of projection objective lens, can solve the problems of increasing the difficulty of objective lens design, design limitations of high-performance projection objective lens, etc., and achieve the effect of improving lithography resolution, high numerical aperture, and reducing difficulty

Inactive Publication Date: 2017-06-13
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

This greatly increases the difficulty of designing the objective lens
Especially for lithography equipment such as desktop STEPPER lithography machines, which have relatively large restrictions on the volume of each subsystem, the design of high-performance projection objective lenses is further restricted

Method used

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  • A projection objective lens for desktop stepper lithography machine
  • A projection objective lens for desktop stepper lithography machine
  • A projection objective lens for desktop stepper lithography machine

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[0047] The structure of the present invention is as attached figure 1 As shown, the light emitted from the high-pressure mercury lamp is collimated and uniformed by the illumination system and then incident on the mask plate in parallel, that is, the object plane of the objective lens. Among them, the maximum size of the mask plate shall not exceed 75mm×75mm. After passing through a projection object used in the desktop STEPPER photolithography machine of the present invention, a mask image of -1 times the same proportion is formed on the surface of the silicon wafer that has been evenly glued.

[0048] as attached figure 1 As shown, the objective lens takes the incident surface of the first lens (L1) facing the object plane as the first surface, and so on along the optical axis, a total of 28 optical surfaces, 14 lenses, and the conjugate distance of the object image is L=500mm. All the lenses are mirror-symmetrical with the diaphragm as the center and have a bi-telecentric...

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Abstract

The invention discloses a projection objective lens for a desktop STEPPER lithography machine. The total optical conjugate length of the objective lens (from the object side to the image side) is L=500mm, and the working distances on the object side and the image side are both 60mm. The object-side effective field of view is 75mm×75mm, and the object-side numerical aperture is NA=0.055. After surface optimization and mechanical structure fine-tuning, the mirror image resolution of the lithography projection objective can reach <5mm. The projection objective lens of the lithography machine has a high numerical aperture, which can effectively improve the resolution of lithography; the total number of projection objective lenses of the lithography machine is small, and no aspherical surface is used, which can effectively balance aberrations at the same time. The difficulty of processing and assembling is reduced; the optical conjugate distance of the projection objective lens of the lithography machine is short, which can be well integrated into the miniaturized lithography equipment.

Description

technical field [0001] The invention relates to a projection objective lens for a desktop STEPPER lithography machine, which belongs to the field of optical system design in micro-nano processing equipment. Background technique [0002] According to Moore's Law, the integration level of integrated circuits will increase by 2 times on the original basis every three years, and the feature size of the device will therefore be reduced to the original value. At present, Moore's Law is still valid, largely due to the progress of lithography equipment. However, while the performance of lithography equipment continues to break through, its volume has also further increased. At present, the large-scale high-precision lithography machine system market is monopolized by ASML in the Netherlands, NIKON in Japan and Canon in Japan. [0003] However, the laboratory-level miniaturized lithography system needs to take into account the cost and equipment volume while ensuring the lithograp...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B13/22G03F7/20
Inventor 刘俊伯程依光赵立新胡松
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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