Polishing solution

Abstract

The invention discloses a polishing solution which is prepared from the following raw materials in parts by weight: 9-15 parts of sodium salicylate, 3-7 parts of methylsilicone oil, 2.5-6 parts of monopotassium phosphate, 6-10 parts of orthophosphate, 1.3-3.8 parts of polyvinyl alcohol, 0.6-1.4 parts of sodium molybdate, 3-8 parts of ethylenediamine tetramethylenephosphonic acid, 3.5-9 parts of zinc sulfate, 2.5-5.8 parts of methylsilicone oil and 2.4-5.4 parts of a dispersing agent. The surface of a part can be well decontaminated by the polishing solution disclosed by the invention, so that the surface of the part is bright and glossy and has a good antirust function.

Description

technical field [0001] The invention relates to a polishing liquid. Background technique [0002] Polishing refers to the use of mechanical, chemical or electrochemical action to reduce the surface roughness of the workpiece to obtain a bright and smooth surface. It is a modification process on the surface of the workpiece by using flexible polishing tools and abrasive particles or other polishing media. In the previous polishing process, mechanical polishing was generally used. The mechanical polishing surface has high flatness, but the surface finish is poor and the damage layer is deep. It is not conducive to the precision of processing. Chemical polishing can obtain a more perfect surface and a higher polishing rate. Widely used in LED industry and semiconductor industry. Contents of the invention [0003] Aiming at the deficiencies of the prior art, the technical problem to be solved by the present invention is to provide a polishing liquid, which can decontaminate...

AI Technical Summary

Problems solved by technology

In the previous polishing process, mechanical polishing was generally used. The mechanical polishing surface has high flatness, but the surface finish is poor and the damage layer is deep.