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Method for treating polysilicon reduction tail gas

A technology of polysilicon and exhaust gas, applied in chemical instruments and methods, silicon compounds, halosilanes, etc., can solve problems such as large power consumption, increasing requirements for large-scale, equipment, pipeline investment, and increased operational instability , to achieve the effects of reducing the amount of gas, reducing energy consumption and equipment investment costs, and reducing the amount of condensation treatment and adsorption treatment

Active Publication Date: 2016-08-24
CHINA ENFI ENGINEERING CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, with the continuous expansion of polysilicon production scale, the requirements for the large-scale reduction tail gas dry recovery system are getting higher and higher, and the investment in equipment and pipelines and the instability of operation are increasing.
At the same time, since the hydrogen in the reduction tail gas participates in the state changes such as condensation and pressurization throughout the process, the power consumption of the refrigeration and compression processes is relatively large

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  • Method for treating polysilicon reduction tail gas
  • Method for treating polysilicon reduction tail gas
  • Method for treating polysilicon reduction tail gas

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Embodiment Construction

[0028] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0029] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial", The orientation or positional relationship indicated by "radial", "circumferential", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the presen...

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Abstract

The invention discloses a method for treating polysilicon reduction tail gas. The method comprises: (1) performing a first condensation treatment on the polysilicon reduction tail gas; (2) using a membrane separator to separate the polysilicon reduction tail gas after the first condensation treatment , so as to obtain hydrogen and mixed gas respectively; (3) supply hydrogen to reduction furnace and carry out reduction reaction with trichlorosilane; (4) carry out second condensation treatment to mixed gas, obtain chlorosilane condensate and noncondensable gas; ( 5) Adsorbing the non-condensable gas to obtain hydrogen and an adsorbent for adsorbing chlorosilane and hydrogen chloride, and supplying a part of the hydrogen to the reduction furnace; (6) using another part of the hydrogen in step (5) to absorb chlorosilane and hydrogen chloride The hydrogen chloride adsorbent is desorbed to obtain a mixture containing chlorosilane and hydrogen chloride; and (7) hydrogenating the mixture with silicon tetrachloride. This method can significantly reduce energy consumption and equipment investment costs.

Description

technical field [0001] The invention belongs to the technical field of polysilicon production, in particular, the invention relates to a method for treating polysilicon reduction tail gas. Background technique [0002] In the process of producing high-purity polysilicon by modified Siemens vapor deposition, the molar ratio of trichlorosilane to hydrogen is about 1:3 to 1:8, and the reaction conversion rate of trichlorosilane to elemental silicon is about 10%. , Therefore, the reduction tail gas contains a large amount of unreacted hydrogen, trichlorosilane and reaction by-products of silicon tetrachloride, hydrogen chloride, dichlorodihydrosilane, etc., wherein the molar ratio of hydrogen accounts for more than 75%. The currently commonly used dry recovery process consists of three parts: "condensation recovery of chlorosilane - absorption and desorption of hydrogen chloride - adsorption purification". However, with the continuous expansion of polysilicon production scale, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107C01B33/035
Inventor 杨永亮张志刚司文学严大洲肖荣晖汤传斌
Owner CHINA ENFI ENGINEERING CORPORATION
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