Titanium-doped alkaline earth borophosphate luminescent thin film and preparation method and application thereof
A technology of borophosphate and luminescent film, which is applied in the field of titanium-doped alkaline earth borophosphate luminescent film
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[0030] The preparation method of the above-mentioned titanium-doped alkaline earth borophosphate luminescent film comprises the following steps:
[0031] Step S11, loading the substrate into the reaction chamber of the chemical vapor deposition equipment, and setting the vacuum degree of the reaction chamber to 1.0×10 -2 Pa~1.0×10 -3 Pa.
[0032] In this embodiment, the substrate is indium tin oxide glass (ITO). It can be understood that in other embodiments, it can also be fluorine-doped tin oxide glass (FTO), aluminum-doped zinc oxide (AZO) or indium-doped glass. zinc oxide (IZO); the substrate was ultrasonically cleaned with toluene, acetone and ethanol for 5 minutes, then rinsed with distilled water, dried with nitrogen and sent to the reaction chamber;
[0033] Preferably, the vacuum degree of the reaction chamber is 4.0×10 -3 Pa.
[0034] Step S12 , heat-treating the substrate at 600° C. to 800° C. for 10 minutes to 30 minutes.
[0035] Step S13, adjusting the tempe...
Embodiment 1
[0067] The substrate is ITO glass, which is ultrasonically cleaned with toluene, acetone and ethanol for 5 minutes, then rinsed with distilled water, air-dried with nitrogen, and sent to the reaction chamber of the equipment. Use a mechanical pump and a molecular pump to evacuate the vacuum of the chamber to 4.0×10 -3 Pa; Then the substrate is heat-treated at 700°C for 20 minutes, and then the temperature is lowered to 500°C. Turn on the rotating motor, adjust the rotating speed of the substrate holder to be 300 rpm, and feed the organic source dicyclopentadiene magnesium (Mg(C 5 h 5 ) 2 ), borane (BH 3 ), phosphine (PH 3 ) and titanium tetraisopropoxide (Ti{OCH(CH 3 ) 2} 4 ) molar ratio is 1:0.3:0.7:0.03, the carrier gas is argon, and the flow rate of argon is 10 sccm. Oxygen is introduced, and the flow rate of oxygen gas is 120 sccm, and the deposition of the film is started. The thickness of the film is deposited to 150nm, close the organic source and carrier gas, ...
Embodiment 2
[0073] The substrate is ITO glass, which is ultrasonically cleaned with toluene, acetone and ethanol for 5 minutes, then rinsed with distilled water, air-dried with nitrogen, and sent to the reaction chamber of the equipment. Use a mechanical pump and a molecular pump to evacuate the vacuum of the chamber to 1.0×10 -3 Pa; Then the substrate is heat-treated at 700°C for 10 minutes, and then the temperature is lowered to 250°C. Turn on the rotating motor, adjust the rotating speed of the substrate holder to be 50 rpm, and feed the machine source dicyclopentadiene magnesium (Mg(C 5 h 5 ) 2 ), borane (BH 3 ), phosphine (PH 3 ) and titanium tetraisopropoxide (Ti{OCH(CH 3 ) 2} 4) molar ratio is 1:0.2:0.8:0.06, the carrier gas is argon, and the flow rate of argon is 10 sccm. Oxygen is introduced, and the flow rate of oxygen gas is 10 sccm, and the deposition of the film is started. The thickness of the film was deposited to 80nm, the organic source and the carrier gas were t...
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