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Wide spectral line projection optical system and photoetching device

A technology of projection optical system and wide spectral line, which is applied in the direction of microlithography exposure equipment, optics, optical components, etc., can solve the problems that the secondary spectrum cannot be fully corrected, and it is difficult to meet the production rate requirements, so as to improve the utilization efficiency of light sources , good correction of other aberrations, and improvement of thermal stability

Active Publication Date: 2014-09-24
ZHANGJIAGANG ZHONGHE AUTOMATION TECH
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Problems solved by technology

The secondary spectrum of axial chromatic aberration is not fully corrected, and only the spectral g-line and i-line can be used, which is difficult to meet the yield requirements

Method used

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  • Wide spectral line projection optical system and photoetching device
  • Wide spectral line projection optical system and photoetching device
  • Wide spectral line projection optical system and photoetching device

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Embodiment Construction

[0049] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0050] see figure 1 , which is a structural schematic diagram of the broadband line projection optical system provided by the preferred embodiment of the present invention. The wide-spectrum projection optical system is used to image images in the object plane (Object) into the image plane (image). The wide-spectrum line projection optical system includes a first mirror group G1, an aperture AS, a second mirror group G2 and a third mirror group along the direction of its optical axis from the enlargement side to the reduction side, that is, from the object plane to the image plane. G3. The wide...

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Abstract

The invention discloses a wide spectral line projection optical system and a photoetching device. The wide spectral line projection optical system is a reduced projection optical system which approaches to a telecentric optical path at object space and image space, and sequentially comprises a first lens set with the positive focal power, a variable-aperture diaphragm, a second lens set and a third lens set with the positive focal power from an object plane to an image plane. The second lens set meets the relation that vd=(nd-1) / (nF-nC) and comprises at least two positive lenses smaller than 1.65 in nd and larger than 65 in vd and at least two negative lenses larger than 1.50 in nd and smaller than 55 in vd. In the third lens set, the lens closest to the image plane is a negative lens, the negative lens has a concave face facing the image plane and meets the relation that the nd is smaller than 1.66, the vd is larger than 58, and ri / ti is larger than 0.6 and smaller than 5.0. The lens sets meet the relation that f1 / L is larger than 0.05 and smaller than 1.3, |f2| / L is larger than 0.3, and f3 / L is larger than 0.03 and smaller than 0.8.

Description

technical field [0001] The present invention relates to an optical system of a lithographic equipment for microfabrication, in particular to a wide-spectrum line projection optical system and a lithography equipment using the wide-spectrum line projection optical system. The broad-spectrum line projection optical system is mainly used in Used in micro-electro-mechanical systems (MEMS, Micro-Electro-Mechanical System), photolithography systems such as semiconductors, solar cells, liquid crystals, printed circuit boards, and projection optical systems for photolithography. Background technique [0002] With the development of projection lithography technology, the performance of the projection optical system is gradually improved, and the projection optical system can already be applied to various fields of microfabrication. High-yield projection optical systems are in increasing demand. When using a broad-spectrum light source such as a mercury lamp, it is desirable to use a...

Claims

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Application Information

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IPC IPC(8): G02B27/18G02B27/00G03F7/20
Inventor 刘鹏
Owner ZHANGJIAGANG ZHONGHE AUTOMATION TECH
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