Graphene nanoribbons and preparation method thereof
A graphene nanoribbon and carbon nanowall technology, applied in coatings, electrolytic components, gaseous chemical plating, etc., can solve the problems of difficulty in controlling the size of graphene nanoribbons, low yield, CNW structure damage, etc., and save research and development. The effect of equipment cost, lower reaction temperature, and structural integrity
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[0027] The preparation process of the graphene nanoribbon of the present invention is roughly divided into the following steps.
[0028] 1. Etching the substrate: put the substrate in a dilute acid solution with a concentration of 0.01-1 mol / L for 0.5-10 minutes, and clean it with deionized water, ethanol and acetone after etching.
[0029] The purpose of this step is to effectively improve the surface structure of the metal substrate by etching the metal substrate to cause defects on the etched surface of the metal substrate, so that carbon nano-walls can grow on the surface of the metal substrate.
[0030] Wherein, the preferred time for etching the metal substrate is 60-180 seconds, and the preferred acid concentration for etching the metal substrate is 0.1-0.5 mol / L. The above preferred etching conditions can achieve a good etching effect and improve the growth efficiency of carbon nanowalls.
[0031] 2. Preparation of carbon nanowalls: put the cleaned substrate into the ...
Embodiment 1
[0041] Example 1: 1. Etching the substrate: The nickel foil was placed in a dilute hydrochloric acid solution with a concentration of 1 mol / L for 0.5 minutes to be etched.
[0042] 2. Preparation of carbon nano-wall: put the cleaned nickel foil into the reaction chamber and remove the air in the reaction chamber, heat the nickel foil to 900°C, and then turn on the ultraviolet light source equipment, so that the ultraviolet light is irradiated on the surface of the nickel foil , and then introduced carbonaceous material methane (flow rate of 200sccm) and protective gas nitrogen, the volume ratio of methane and nitrogen was 2:1, and kept for 100 minutes.
[0043] After the reaction is completed, stop feeding the carbonaceous material, stop heating the nickel foil and turn off the light source equipment. After the reaction chamber is cooled to room temperature, stop feeding nitrogen. The carbon nano-wall can be obtained on the surface of the nickel foil and scrape it from the surf...
Embodiment 2
[0045] Example 2: 1. Etching the substrate: put the iron foil into a dilute sulfuric acid solution with a concentration of 0.5 mol / L and etch for 4 minutes. After the etching is completed, wash with deionized water, ethanol and acetone in sequence.
[0046] 2. Preparation of carbon nano-walls: put the cleaned iron foil into the reaction chamber and remove the air in the reaction chamber, heat the iron foil to 600°C, and then turn on the ultraviolet light source equipment to irradiate the surface of the iron foil with ultraviolet light , and then passed carbon-containing ethane (flow rate of 100sccm) and protective gas argon, the volume ratio of ethane to argon was 5:1, and kept for 200 minutes.
[0047] After the reaction is completed, stop feeding carbon-containing substances, stop heating the iron foil and turn off the light source equipment. After the reaction chamber is cooled to room temperature, stop feeding argon gas, and carbon nanowalls can be obtained on the surface o...
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