Bigrid optoelectronic thin film transistor, pixel circuit and pixel array
A technology for optoelectronic thin films and pixel circuits, applied in transistors, circuits, and electrical solid-state devices, etc., can solve the problems of low integration, poor pixel performance, and complex manufacturing processes.
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[0042] see Figure 4 , which is one of the cross-sectional structure diagrams of a double-gate photoelectric thin film transistor of the present invention. The double-gate photoelectric thin film transistor includes a substrate 1 , a dark gate 2 , a first dielectric layer 3 , a source 4 , a drain 5 , a channel layer 6 , a second dielectric layer 7 and a light gate 8 . The substrate 1 can be a glass substrate, a plastic substrate or other substrates; in the present invention, a glass substrate is used. The dark gate 2 is disposed on the substrate 1 and is made of metal or metal alloy, such as molybdenum, chromium or aluminum or their alloys. The first dielectric layer 3 is disposed on the substrate 1 and covers the dark gate 2 . The source 4 and the drain 5 are disposed on the first dielectric layer 3 and are in contact with both ends of the first dielectric layer 3 correspondingly; the channel layer 6 is disposed on the first dielectric layer 3 and cover the source 4 and th...
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