Process for preparing corrosion resistant metal material through coating tantalum or niobium with PVD (physical vapor deposition) method
A technology for corrosion-resistant metals and metal materials, applied in metal material coating technology, sputtering plating, ion implantation plating, etc., can solve problems such as high melting point and unsuitable anti-corrosion layer
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[0014] In this embodiment, magnetron sputtering is adopted, and a protective layer of tantalum and niobium is coated on the surface of the substrate by using a magnetron sputtering apparatus. The equipment model used: JGP-450A magnetron sputtering deposition system produced by Shenyang Scientific Instrument Development Center Co., Ltd., Chinese Academy of Sciences.
[0015] The principle is that the target as the cathode is under the action of an electromagnetic field, and the surface of the target produces a glow effect, and an ionized plasma gas is formed above the target. These energetic ions (mostly Ar ions) excite the target to make the target on the target Tantalum and niobium atoms are deposited onto the substrate.
[0016] The target used is a tantalum or niobium target with a purity of 99.96. The diameter of the target is 60 mm and the thickness is 5 mm. The surface area corresponding to the coated substrate and the target cannot exceed the area of the target. Unde...
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