Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Manufacturing method of metal-plastic multilayer photomask

A technology of metal plastics and manufacturing methods, which is applied in the direction of metal layered products, chemical instruments and methods, and originals for photomechanical processing, etc., can solve the problems of high unit price and high probability of damage of a single metal mask, and achieve increased adhesion effect , The effect of increasing the marriage rate and prolonging the replacement cycle

Active Publication Date: 2016-06-29
世禾科技股份有限公司
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] 3. The unit price of a single metal mask is also quite expensive. The more times a thin metal mask is taken out, the higher the probability of damage due to improper operation, which will cause additional expenses for equipment manufacturers

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Manufacturing method of metal-plastic multilayer photomask
  • Manufacturing method of metal-plastic multilayer photomask
  • Manufacturing method of metal-plastic multilayer photomask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] figure 1 and figure 2 Shown is a plan view and a partial section enlarged view of the present invention. The present invention is a metal-plastic multi-layer photomask 1, which is mainly used in the manufacturing process of optoelectronic products. On the substrate to be processed, a film with a specific pattern is deposited on a substrate to be processed. The substrate is a material containing silicon or glass. , such as the substrate of a liquid crystal screen. The multi-layer photomask 1 is a sheet-shaped frame, and at least one pattern unit 11 is formed through the frame. The contour shape of the pattern unit 11 is the shape corresponding to the aforementioned specific pattern, and the specific pattern depends on the manufacturer's requirements. It is convenient to deposit the corresponding thin film on the substrate in the manufacturing process of optoelectronic products.

[0036] The main improvement of the present invention is to design the multi-layer photom...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a metallic-plastic multi-layered photomask and a manufacturing method thereof, which are mainly used in the manufacturing technology of photoelectric products. The multi-layered photomask is composed of a metallic photomask and a resin layer formed on the surface of the metallic photomask, wherein the resin layer is softer than the metallic photomask. The manufacturing method of the multi-layered photomask comprises the following steps: performing thermal debinding on the metallic photomask, further coating the surface of the metallic photomask with a resin layer by means of electrophoresis treatment, and then, orderly performing the operations of cleaning, drying and molding, thus forming the multi-layered photomask. Due to the resin layer, the multi-layered photomask provided by the invention can achieve the effects of buffering and wear resistance in the clamping fixation work of the manufacturing technology, so that the replacement cycle and service life of the multi-layered photomask are prolonged, and the quality of the manufacturing technology is also improved.

Description

technical field [0001] The present invention relates to the production technology of optoelectronic products, in particular to a kind of metal-plastic multi-layer photomask applied in the manufacturing process of optoelectronic products, which can prolong the replacement cycle of such photomasks, improve the quality of production, and reduce production costs Production method. Background technique [0002] In the current optoelectronic products, such as the panel of the liquid crystal screen, some thin films of different materials are deposited on the glass substrate during the manufacturing process using a photomask, and the process includes but not limited to coating, exposure, etching, development, cleaning , Baking and other steps, use multiple different masks to operate in sequence, and plan the designed structure layer by layer. Among the above-mentioned mask costs, the mask made of quartz material is the highest. This kind of mask can meet the manufacturing process c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/48B32B15/092B32B15/082
Inventor 严启祯何启源
Owner 世禾科技股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com