Double-cavity etalon

A double-cavity etalon and consistent technology, applied in the field of optics, can solve problems such as difficult manufacturing schemes, and achieve the effect of easy implementation and simple structure and process

Inactive Publication Date: 2014-03-26
SHANGHAI BRANCH FUZHOU GAOYI COMM CO LTD
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This is very difficult for the production scheme that only achieves thickness control through cold working

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-cavity etalon
  • Double-cavity etalon
  • Double-cavity etalon

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0018] The present invention adopts a double-cavity etalon combining a fixed cavity and a tuning cavity, and through micro-tuning of a micro-control system, the two single-cavity etalons constituting the double-cavity etalon have strictly consistent transmission peaks, so that the double-cavity etalon It has a flat-top transmission peak with high precision, which solves the problem that the traditional double-cavity etalon is difficult to control the transmission peaks of two single cavities to be consistent. Moreover, the passband period of a single etalon cavity is very thin, for example, the 50GHz etalon has a passband period of 10 -1 nm level. Specifically, the double-chamber etalon of the present invention includes a fixed cavity, a tuning cavity and a micro-control system, the tuning cavity and the fixed cavity have the same transmission...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the field of optics, and discloses a double-cavity etalon. The double-cavity etalon comprises a fixing cavity, a tuning cavity and a micro-control system, wherein the tuning cavity and the fixing cavity have consistent penetrated peaks, and the micro-control system is connected with the tuning cavity and slightly regulates the penetrated peak of the tuning cavity. According to the double-cavity etalon, the combination of the fixed cavity and the tuning cavity is adopted; through the slight tuning of the micro-control system, two single-cavity etalons forming the double-cavity etalon have the strictly consistent penetrated peaks, and the double-cavity etalon has flat top type penetrated peaks with high degree of finish so as to be suitable for wavelength locking in a laser. The structure is simple and convenient in process and is easy to achieve.

Description

technical field [0001] The invention relates to the field of optics, in particular to a double-cavity etalon. Background technique [0002] The etalon is a comb-shaped filter optical element, and its main technical indicators include: free spectral range, transmission peak, fineness, etc. In the fields of optics and optical communication, standards are widely used. [0003] The wave locker is a device used to lock the wavelength of the laser, and its core component is the etalon. The general principle of this application is as follows: under normal circumstances, the output wavelength of the laser coincides with the transmission peak of the etalon, and the laser is output from the laser, passes through the etalon, and then reaches the application end. At this time, the ratio of the optical power output by the laser from the laser to the optical power after passing through the etalon is in a minimum state. When the output wavelength of the laser drifts, due to the filterin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B26/00G02B5/28
Inventor 吴砺张新汉潘忠灵林磊
Owner SHANGHAI BRANCH FUZHOU GAOYI COMM CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap