Method for preparing graphene and porous amorphous carbon films simultaneously
An amorphous carbon and graphene technology, which is applied in the field of chemical vapor deposition to prepare thin films, can solve the problems of inability to obtain self-supporting amorphous carbon films, inability to obtain porous structured carbon films, restricting basic research and applications, etc. Simple operation and simple equipment effect
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[0024] In order to make the objectives, technical solutions and advantages of the present invention clearer, the following further describes the present invention in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.
[0025] The invention relates to the technical field of thin film preparation by chemical vapor deposition. More particularly, the present invention relates to the simultaneous preparation of a large-area graphene film and a porous amorphous carbon film on a nickel metal substrate through a single growth using chemical vapor deposition. The chemical vapor deposition technology has simple equipment and ...
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