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Method for preparing graphene and porous amorphous carbon films simultaneously

An amorphous carbon and graphene technology, which is applied in the field of chemical vapor deposition to prepare thin films, can solve the problems of inability to obtain self-supporting amorphous carbon films, inability to obtain porous structured carbon films, restricting basic research and applications, etc. Simple operation and simple equipment effect

Inactive Publication Date: 2014-03-05
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, there are several problems in all these technologies. One is that the carbon film preparation process has a high ambient temperature. Therefore, generally, the amorphous carbon film is prepared on a hard substrate (such as quartz glass, mica, silicon wafer or directly on the surface of the workpiece). , so that the application of amorphous carbon films is subject to certain restrictions; second, the amorphous carbon films prepared by these techniques are dense films, and porous carbon films cannot be obtained; third, most of the amorphous carbon films prepared by these techniques are diamond-like amorphous crystalline carbon film; the fourth is that these technologies cannot obtain a self-supporting amorphous carbon film with a special structure, and the self-supporting amorphous carbon film can be easily transferred to any substrate
It can be seen that there are some defects in the current preparation technology of amorphous carbon thin film, which restrict its basic research and application.

Method used

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  • Method for preparing graphene and porous amorphous carbon films simultaneously
  • Method for preparing graphene and porous amorphous carbon films simultaneously
  • Method for preparing graphene and porous amorphous carbon films simultaneously

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Embodiment Construction

[0024] In order to make the objectives, technical solutions and advantages of the present invention clearer, the following further describes the present invention in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0025] The invention relates to the technical field of thin film preparation by chemical vapor deposition. More particularly, the present invention relates to the simultaneous preparation of a large-area graphene film and a porous amorphous carbon film on a nickel metal substrate through a single growth using chemical vapor deposition. The chemical vapor deposition technology has simple equipment and ...

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Abstract

The invention discloses a method for preparing graphene and porous amorphous carbon films simultaneously. The method comprises the following steps: S1, ultrasonically cleaning a metal nickel sheet substrate, drying the metal nickel sheet substrate and placing the metal nickel sheet substrate into a tube furnace; S2, introducing inert gases into the tube furnace; S3, heating the tube furnace to 750 to 1,000 DEG C and maintaining for 10 to 50 minutes, introducing hydrogen into the tube furnace, and performing heat treatment on the metal nickel sheet substrate; and S4, introducing hydrocarbon compounds with the flow quantity of 20 to 100 sccm into the tube furnace, cracking the hydrocarbon compounds under the catalysis of the metal nickel sheet substrate subjected to heat treatment, dissolving carbon by a nickel sheet, and growing graphene and porous amorphous carbon films simultaneously; and S5, cooling the tube furnace, soaking the nickel sheet, on which the graphene and the porous amorphous carbon films grow, into corrosive liquid, and corroding the substrate nickel sheet to obtain the graphene and the porous amorphous carbon films. The hydrocarbon compounds serve as carbon sources, the adsorption cracking of the carbon sources on the surface of the substrate nickel sheet under the high temperature condition is controlled, and carbon atoms are dissolved into the nickel sheet, so that the graphene and the porous amorphous carbon films can be obtained simultaneously.

Description

Technical field [0001] The invention belongs to the technical field of film preparation by chemical vapor deposition, and more specifically, relates to a method for simultaneously preparing graphene and a porous amorphous carbon film. Background technique [0002] Carbon is one of the most abundant elements in nature, and carbon materials composed of carbon have many allotropes. In 2004, Geim and others of the University of Manchester in the United Kingdom prepared and observed a special carbon film on a piece of graphite for the first time using a mechanical separation method-single-layer graphite (graphene), thus starting the research boom of graphene materials. Graphene is composed of a single layer of atoms and has a two-dimensional honeycomb structure. This special structure gives the graphene material unique optical, electrical, thermal and mechanical properties. These superior properties have shown great application potential in nanoelectronic devices, lithium-ion battery...

Claims

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Application Information

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IPC IPC(8): C01B31/04C01B31/02C01B32/05C01B32/186
Inventor 朱大明魏合林袁利利刘雨昊易林
Owner HUAZHONG UNIV OF SCI & TECH
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