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A calibration method for optical constants of metal and semiconductor thin film materials

A technology of optical constants and calibration methods, which is applied in the direction of color/spectral characteristic measurement, measuring device, scattering characteristic measurement, etc. It can solve the problems of inability to judge the correct solution and the low precision of the solution parameter solution process, so as to eliminate errors and be widely applicable The effect of reducing the error

Active Publication Date: 2016-06-29
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

However, the error of the theoretical calculation model itself and too many solution parameters make the accuracy of the solution process extremely low
figure 1 The solution space obtained when solving the optical constant of the Cr metal thin film at 900nm by the transmission spectroscopy method, the intersection of the contour lines in the figure are all possible solutions, which actually cannot judge the correct solution

Method used

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  • A calibration method for optical constants of metal and semiconductor thin film materials
  • A calibration method for optical constants of metal and semiconductor thin film materials
  • A calibration method for optical constants of metal and semiconductor thin film materials

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Embodiment 1

[0030] Embodiment 1: Calibration of optical constants of electron beam evaporated Cr film

[0031] 1. According to the method mentioned above, the optical constants of Cr thin films evaporated by electron beams were calibrated. We prepared thin film samples with an estimated physical thickness of 15-100 nm, and deposited them on BK7 optical glass at a deposition rate of 0.2 nm / s.

[0032] 2. The X-ray small-angle reflectance curve was tested for the film sample, and the X-ray with a wavelength of 0.154nm was selected for testing. Test curve such as figure 2 shown.

[0033] 3. According to the modified Bragg equation sin 2 θ m =(λ / 2d) 2 m 2 +2δ, λ=0.154nm Statistical data are shown in Table 1, and then do linear regression analysis, such as image 3 As shown, the thickness of the obtained film is 24.32 nm.

[0034] 4. The transmittance and reflectance values ​​of the test film at 0 degrees are shown in Table 2, and the test wavelength is from 415nm to 800nm.

[0035] 5...

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Abstract

The invention relates to a method capable of accurately calibrating optical constants of metal and semiconductor thin film materials. This method is applicable to thin-film metal and semiconductor materials prepared by any process, and the process is as follows: preparation of thin-film samples with a thickness of 15-100nm; accurate calibration of thickness by X-ray total reflection spectroscopy; testing of transmittance and reflectance spectra; Graphical method to solve optical constants. Compared with the traditional spectral direct analysis method, this method can solve the problem of accurate calculation of the thickness of metal and semiconductor films, reduce the error caused by the inability to accurately calibrate the thickness, simplify the solution process, and improve the accuracy and speed of the optical constant solution. The method has wide applicability and can provide accurate reference data for all scientific and engineering problems involving the optical constants of metal and semiconductor thin film materials.

Description

technical field [0001] The invention relates to the field of basic research on the application of thin film materials, in particular to a calibration method for optical constants of metal and semiconductor thin film materials. Background technique [0002] Optical constants (N=n-k*i) are one of the fundamental properties of materials. The calibration of optical constants of thin film materials is the prerequisite for the optical application of such materials. Metal and semiconductor thin film materials are widely used in various fields, such as thin film solar cells, photothermal selective films, LED chip design, etc. In these specific applications, the premise of thin film structure design is to accurately calibrate the optical constants of the material. However, since metals and semiconductors are strong absorbing materials, the imaginary part k of their optical constants is not equal to 0, and there is one more unknown in the solution process than dielectric materials, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/25G01N21/55G01B15/02
Inventor 邓淞文李刚孙龙
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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