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High-performance niobium oxide target material and preparation method thereof

A high-performance technology of niobium oxide, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of low activity, low production efficiency and high cost of niobium oxide powder, and achieve shortening of sintering time, Improved molding efficiency and uniform compactness

Active Publication Date: 2014-02-12
河北东同光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the low activity of the niobium oxide powder used in the commonly used hot pressing sintering process, there are generally problems of low production efficiency, high cost, long cycle, high energy consumption and low performance.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Weigh 1980 g of high-purity niobium oxide powder and 20 g of activator carbon powder, mix them in a mixer for 1 hour, then put them into an atmospheric calciner at 450° C. for 2 hours. After cooling down to normal temperature naturally, take it out, then add 20 g of high-purity reducing agent niobium powder, and mix for 2 hours. Put the mixed powder into a special graphite mold for vacuum sintering. Sintering system: (1) Use a rapid heating device to uniformly heat up to 1100°C within 2 hours, and hold the temperature at 12MP for 1 hour. (2) Use a quick cooling device to shorten the cooling time, and cool down to 50°C at a uniform speed within 7 hours. The sintering period was 10 hours.

Embodiment 2

[0030] Weigh 1900 g of high-purity niobium oxide powder and 15 g of activator carbon powder, mix them in a mixer for 2 hours, put them into an atmospheric calciner at 480° C. and keep them warm for 4.5 hours. After cooling down to normal temperature naturally, take it out, then add 100g of high-purity reducing agent tantalum powder, and mix for 2 hours. Put the uniformly mixed powder into a graphite mold for vacuum hot pressing sintering. Sintering system: (1) Use a rapid heating device to raise the temperature to 950°C within 2 hours and keep it for 1 hour, and hold the pressure for 1.5 hours under the pressure of 15 Mp carbon powder. (2) After the pressure holding is completed, use a quick cooling device to cool down to 80°C within 7 hours. The sintering cycle was 11.5 hours.

Embodiment 3

[0032] Weigh 1820 g of high-purity niobium oxide powder and 18 g of activator carbon powder, mix them in a mixer for 2 hours, put them into an atmospheric calciner at 480° C. and keep them warm for 4.5 hours. After cooling down to normal temperature naturally, take it out, then add 180g of high-purity reducing agent tantalum powder, and mix for 2 hours. Put the uniformly mixed powder into a graphite mold for vacuum hot pressing sintering. Sintering system: (1) Use a rapid heating device to raise the temperature to 1100°C within 1 hour and keep it for 2 hours, and hold the pressure for 2 hours under the pressure of 18 Mp carbon powder. (2) After the pressure holding is completed, use a quick cooling device to cool down to 100°C within 7 hours. The sintering period was 12 hours.

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Abstract

The invention relates to a high-performance niobium oxide target material, which is prepared from the following raw materials in percentage by mass: 89-98.8% of niobium oxide powder, 0.2-1% of activator carbon powder, and 1-10% of a reductant, wherein the reductant is selected from niobium powder or tantalum powder. The invention also provides a preparation method of the niobium oxide target material. The high-performance niobium oxide target material and preparation method thereof disclosed by the invention have the following advantages that (1) the preparation method is high in efficiency: the sintering cycle of the target material is short, only 10-15 hours; and (2) the target optimal is good in performance: the density is high, and can reach more than 99.95% of the relative density; the electrical conductivity is good, and the electrical resistivity is 3*10<-3>-9*10<-3> omega.cm; the target material is uniform in compactness, and has no pit.

Description

technical field [0001] The invention relates to a sputtering coating target material, in particular to a high-performance niobium oxide target material and a preparation method thereof. Background technique [0002] Niobium oxide target is an important material for the preparation of AR glass (anti-reflection and anti-reflection glass) and ITO (indium tin oxide) glass. AR glass uses the most advanced magnetron sputtering coating technology in the world to coat a layer of niobium oxide anti-reflection film on the surface of ordinary tempered glass, which can effectively reduce the reflection of the glass itself, increase the transmittance of the glass, and make the Colors that were originally seen through the glass are more vibrant and true to life. The shadow-eliminating ITO glass is coated with a layer of AR film between the ITO film and the glass. While satisfying the conductivity of ITO, it also has the following advantages: 1. The glass transmittance is high. Under the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35
Inventor 康明生崔娜朱辉齐孟强吴元海吴洁闫丽娜
Owner 河北东同光电科技有限公司
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