Sputtering ion gun

Abstract

The invention discloses a sputtering ion gun which is provided with an airflow direction regulating device, an argon ion generating device and a focusing lens, wherein the argon ion generating device is internally provided with an on-load voltage adjustable electronic accelerating grid mesh and a lamp filament correlated with a reference point position of the electronic accelerating grid mesh; one side wall of the electronic accelerating grid mesh is provided with a circular tube of a metal mesh; the electronic accelerating grid mesh is provided with a grid mesh anode at the front end and a grid mesh cathode at the rear end; the motion speeds of argon ions along the axial direction of the grid mesh are controlled through regulating a voltage loaded on the electronic accelerating grid mesh, thus the ion generating efficiency is regulated. The sputtering ion gun can be used alone during surface etching or deep analysis, and can be used for obtaining an improved surface treatment effect and ensuring that a surface treatment process is controllable. The ion sputtering and vacuum annealing can be adopted for performing repeated circular treatment during sample surface cleaning treatment or surface reconstruction. The material of the whole set of ion gun completely meets the requirement for use in an ultrahigh-vacuum environment, and can resist to baking at high temperature of over 200 DEG C.

Description

technical field [0001] The invention relates to a sputtering ion gun, which relates to the electronic optics or ion optics device of the patent classification number H01 basic electrical component H01J discharge tube or discharge lamp H01J3 / 00 commonly used in two or more basic types of discharge tubes or lamps Parts or parts of the ion trap H01J3 / 04 ion gun. Background technique [0002] In current scientific research and engineering applications, surface science is playing an important role, and it is a basic link in the synthesis of new materials and the analysis of physical and chemical properties of materials, especially in the preparation of nanoscale materials and nanomanufacturing. . Obtaining and controlling surface structure is the basis of surface science and the premise of nanotechnology. Typical surface treatment methods include dissociation, annealing and ion sputtering, and annealing and ion sputtering are almost the standard configurations of surface analys...

AI Technical Summary

Problems solved by technology

The ionization efficiency is low, the ion movement speed is low, there is a direction deviation during ion spraying, and the treatment process cannot be controlled, so it is difficult to achieve the desired effect in the surface treatment of materials.

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