A UHF Plasma Flow Measuring Device
A plasma and flow measurement technology, which is used in measurement devices, fluid dynamics tests, and testing of machine/structural components. and other problems, to achieve the effect of good common mode rejection ratio, excellent output signal and high signal-to-noise ratio
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0034] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0035] The invention provides an ultra-high frequency response plasma flow measurement device, which is based on the principle of glow discharge, such as figure 1 As shown, after a certain voltage is applied between the electrodes, a plasma field is generated. When the flow velocity and pressure change, it will affect the distribution of plasma between the electrodes. In this way, in order to maintain the uniform distribution of plasma between the electrodes, the applied voltage will change accordingly, that is, by measuring the applied voltage on the electrodes The voltage fluctuation responds to the fluctuation of flow velocity field and pressure field. Therefore, the present invention captures the details of the unste...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com