An auxiliary device for plasma cleaning of components

A plasma cleaning and auxiliary device technology, applied in cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems of high cleaning cost, easy damage to small-sized components, low cleaning efficiency, etc., to save cleaning costs and avoid accumulation. And the effect of rubbing each other and avoiding rubbing each other

Active Publication Date: 2016-06-29
EAST CHINA INST OF OPTOELECTRONICS INTEGRATEDDEVICE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide an auxiliary device for plasma cleaning of circuit components with high reliability, which overcomes the disadvantages of easy damage to small-sized components, low cleaning efficiency or high cleaning cost during the plasma cleaning process.

Method used

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  • An auxiliary device for plasma cleaning of components
  • An auxiliary device for plasma cleaning of components
  • An auxiliary device for plasma cleaning of components

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] The overall structure of a component plasma cleaning auxiliary device provided by the present invention is as follows figure 1 Shown:

[0022] It includes a tray composed of a bracket 1, a rectangular frame 2, and a tray bottom 3. Among them, the bracket 1 is connected with the frame 2 by threads or glue to play a supporting role. A certain number of stainless steel wire mesh 3 is used as the bottom of the tray and connected to the frame 2 through a mesh stretching process to form a tray with a wire mesh at the bottom.

Embodiment 2

[0024] Such as figure 2 , image 3 As shown, a partition 2a can also be provided in the middle of the frame 2 to divide the tray into two areas. One area retains the screen 3 as the bottom of the tray, and the other area uses 704 or 705 silica gel 3a on the bottom of the tray. Spread evenly on the silk screen.

[0025] Figure 4 Is the invention adopts figure 2 The shown schematic diagram of the cleaning device containing and cleaning components.

[0026] When in use, first place the components 4 to be cleaned on both sides on the screen 3 in the left area, and place them in a single layer to avoid stacking of components and mutual friction; then put the single-sided cleaning components 5 on the silica gel 3a in the right area. Single layer placement to avoid component accumulation and mutual friction. Then the cleaning device of the present invention is put into a plasma cleaning machine, and the cleaning process is completed through air extraction, inflation, ion bombardment ...

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PUM

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Abstract

The invention relates to a plasma cleaning auxiliary device for components and parts. The bottom of a frame (2) is connected with a screen mesh (3) to serve as the bottom of a tray, a partition plate (4) is arranged in the middle of the frame (2) to divide the tray into two areas, and 704 or 705 silica gel (3a) is coated on the screen mesh (3) in one area. When the plasma cleaning auxiliary device is used, an element (4) cleaned in a double-side mode is arranged on the screen mesh (3) on the left area, an element (5) cleaned in a single-side mode is arranged on the silica gel (3a) on the right area, and finally a cleaning device is arranged into a plasma cleaning machine to be cleaned. The plasma cleaning auxiliary device has the advantages that by means of the action of leakage holes of the screen mesh, plasma can bombard the elements from all sides, and the cleaning efficiency is remarkably improved. The screen mesh can dredge and disperse airflow to prevent the elements from being blown by the airflow, piled and rubbed. The silica gel can absorb the components and the parts to prevent the components and the parts from being blown by the airflow, piled and rubbed. Compared with a method using a blue film or a UV film to fix the elements, the plasma cleaning auxiliary device removes a special film shifting machine and a special ultraviolet light machine and saves cleaning cost.

Description

Technical field [0001] The invention relates to the field of electronic product manufacturing, in particular to a plasma cleaning device before assembly of components of microelectronic products. Background technique [0002] The plasma cleaning process mainly uses active plasma with a certain energy to carry out the dual effects of physical bombardment and chemical reaction on the object to be cleaned, so that the surface material of the object to be cleaned becomes particles and gaseous substances, which are exhausted by vacuum to achieve the cleaning purpose. In the plasma cleaning process, pumping, charging, ion bombardment and chemical reactions are the main processes. [0003] High-reliability and quality-level assembly circuits, in order to improve assembly reliability, the components (mainly passive terminal electrode components and active device bare chips) need to be plasma cleaned to remove oxidation on the soldering surface before assembly to reduce bonding / The contac...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B13/00
Inventor 李波夏俊生李寿胜侯育增李文才
Owner EAST CHINA INST OF OPTOELECTRONICS INTEGRATEDDEVICE
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