Wet etching apparatus and wet etching method

Abstract

The invention relates to the technical field of etching, and discloses a wet etching apparatus and a wet etching method. The wet etching apparatus comprises a plate receiving chamber, a temperature control chamber, a wet etching chamber, a plate discharging chamber, a conveyer and a temperature control system positioned in the temperature control chamber, and an etching object is conveyed by the conveyer and sequentially goes through the plate receiving chamber, the temperature control chamber, the wet etching chamber and the plate discharging chamber; and the temperature control system is used for adjusting the temperature of the etching object to a preset temperature. The invention also provides the wet etching method. By adopting the above technical scheme in the invention, the temperature of the etching object is adjusted to the preset temperature, so when the etching object is etched by an etching solution, the etching rate consistency is guaranteed, the continuous stability of the etching production is improved, and the large-scale continuous online production requirement can be adapted.

Description

technical field [0001] The invention relates to the technical field of wet etching, in particular to a wet etching device and a wet etching method. Background technique [0002] The wet etching process mainly refers to the etching technology that uses liquid chemicals to remove the etchant. Wet etching is a chemical reaction between an appropriate etching solution and the etchant to change the structure of the etchant and the morphology of the surface of the etchant, so that the etchant can produce a light-trapping structure and the morphology required by the subsequent coating film. structure. [0003] Such as figure 1 As shown, the existing wet etching equipment includes: a plate receiving device 1, a first cleaning device 2, an etching device 3, a second cleaning device 4, an air-drying device 5 and a plate discharging device 6, and the substrate is conveyed on the conveying roller table Under the action, it passes through each device of the etching equipment in turn. ...

AI Technical Summary

Problems solved by technology

[0004] In the prior art, during continuous online production, the temperature of the substrate is likely to be higher than the optimum etching solution temperature for etching production. When the substrate is in contact with the etching solution, the temperature of the etching solution will gradually increase. The change of etching solution temperature directly affects the etching reaction rate, resulting in inconsistencies in the etching degree of each etching product. Therefore, the continuous stability of etching production is poor, and it cannot meet the requirements of large-scale continuous on-line production

Images