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A coarse and fine moving stacking worktable

A technology of workbench and coarse motion table, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problem of not being able to meet the requirements of high speed, large load and high dynamic characteristics of lithography equipment, and not being able to adapt well to two tables Exchange system, poor structural integrity and other problems, to achieve the effect of compact structure, reducing the number of parts, and reducing the requirements for high precision

Active Publication Date: 2015-09-30
TSINGHUA UNIV +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Due to factors such as the frictional damping nonlinearity of the support system, the first two types of micro-motion stages cannot meet the requirements of high speed, large load, and high dynamic characteristics of lithography equipment.
The micro-motion table with voice coil motor / air support can meet the requirements of lithography equipment, but it has poor structural integrity, thick table body, high center of mass, etc., and its performance is limited to a certain extent.
[0006] Tsinghua University applied for a six-degree-of-freedom precision stage on June 29, 2007 (application number: 200710118130.5), providing a six-degree-of-freedom precision stage for silicon wafer stages in lithography machines, using frictionless damping The voice coil motor is used as the driving structure, although the positioning accuracy is greatly improved, but the structure is large and not compact, and cannot well meet the needs of the dual switching system

Method used

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  • A coarse and fine moving stacking worktable
  • A coarse and fine moving stacking worktable
  • A coarse and fine moving stacking worktable

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Embodiment Construction

[0020] figure 1 It is a three-dimensional structural diagram of a coarse-fine motion lamination workbench provided by the present invention. The workbench includes a fine motion table, a coarse motion table, a balance weight 2 and a vibration isolator 5 . The fine motion table and the coarse motion table are stacked on the upper surface of the balance weight, and the fine motion table is composed of a supporting piece table 1, a fine motion table mover frame 12, a fine motion table stator frame 10 and an electromagnetic drive module. The bearing table 1 is fixed on the top of the fine motion table mover skeleton 12, and the electromagnetic force drive module of the fine motion table includes four sets of the first three degrees of freedom movement in the horizontal plane along the X direction, the Y direction and around the Z axis. An electromagnetic force drive module 8 and four sets of second electromagnetic force drive modules 9 that realize the movement of the three degre...

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Abstract

A coarse / precision laminated workbench is mainly applied in semiconductor photoetching equipment. The workbench provided by the invention contains a first electromagnetism driver module for driving a precision stage to rotate around the Z axis in the X,Y directions in a horizontal plane and a second electromagnetism driver module for driving the precision stage to rotate around the X, Y axis in the Z direction. There are respectively four groups of the first and second electromagnetism driver modules. Four first electromagnetism driver modules and four second electromagnetism driver modules are arranged alternatingly. A permanent magnet, a yoke and a permanent magnet framework of each first electromagnetism driver module and a permanent magnet and a permanent magnet framework of each second electromagnetism driver module together form a runner part of the precision stage. Coils, coil skeletons and microchecker bases of the four first electromagnetism driver modules and the four second electromagnetism driver modules together form a stator part of the precision stage. The coarse / precision laminated workbench provided by the invention has a simpler and more compact structure, is centroid driven and has small inertia of the runner of the microchecker.

Description

technical field [0001] The invention relates to a precision motion table, in particular to a six-degree-of-freedom precision motion table, which is mainly used in semiconductor photolithography equipment and belongs to the technical field of ultra-precision processing and detection equipment. Background technique [0002] The precision table with high precision and fast response has an extremely important position in modern manufacturing technology, and is regarded as an important symbol of a country's high-tech development level. In ultra-precision machine tools, the ultra-precision precision table is used to compensate the error of the feed system to achieve ultra-precision machining; in the manufacture of large-scale integrated circuits, the ultra-precision fine table is used Feed; In scanning probe microscope, the ultra-precision fine motion table is used to measure the surface topography of the sample and perform nano-processing; in bioengineering, the ultra-precision f...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 张鸣朱煜成荣刘召杨开明徐登峰田丽张利叶伟楠张金穆海华尹文生胡金春赵彦坡秦慧超胡清平
Owner TSINGHUA UNIV
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