Cleaning method and cleaning system of reaction cavity
A cleaning system and reaction chamber technology, applied in the field of reaction chamber cleaning and reaction chamber cleaning systems, can solve problems such as uneven cleaning, inconsistent path length, inconsistent cleaning speed, etc., to shorten cleaning time, reduce production costs, and save Effect of purge gas
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[0069] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0070] In the following description, many specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways than those described here, so the present invention is not limited by the specific embodiments disclosed below.
[0071] As mentioned in the background technology section, when only RPS is used to clean the reaction chamber in the prior art, there are disadvantages such as long cleaning time, waste of cleaning gas, and uneven cleaning. When only the in-situ plasma cleaning process is used to clean the reaction chamber, It has the disadvantages of uneven cleaning, low cleaning efficiency and long cleaning time.
[0072] In view of the above defects, t...
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