Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Large immersion type ring polishing machine

A ring polishing machine, immersion technology, applied in surface polishing machine tools, grinding/polishing equipment, metal processing equipment, etc. The effect of maintaining stable parameters, improving machining accuracy and reducing environmental pollution

Active Publication Date: 2013-10-30
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF6 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This has not only caused a lot of waste, increased production costs, but also caused greater pollution to the surrounding environment.
According to statistics, the daily consumption of polishing fluid for a ring polishing machine is about 2,000 yuan, which is not conducive to the long-term and sustainable development requirements of this field.
In addition, the traditional manual operation method of adding polishing liquid relies heavily on the experience of workers, lacks long-term stability and controllability, is not conducive to real-time monitoring and testing of polishing liquid, and has a low degree of standardization
Finally, the diameter of modern large-scale ring polishing machines is often more than 4m. Simply relying on manual methods lacks an overall grasp of the polishing rubber disc, which is likely to cause unstable addition of polishing fluid and uneven grinding of workpieces. The efficiency is low, and the deterministic processing of polishing cannot be realized
[0004] Most of the current large-scale ring polishing machines are non-immersed polishing, and the polishing powder is added manually, which not only causes a lot of waste, but also causes certain harm to workers and the environment; in addition, although some units have realized immersion Processing method, but simply immersing the workpiece in the polishing liquid, without further filtering and refining the polishing liquid, the polishing effect is poor, and the advantages of the immersion polishing method cannot be reflected

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Large immersion type ring polishing machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] The present invention will be further described below in conjunction with embodiment, but should not limit the transformation scope of the present invention with this.

[0020] see first figure 1 , figure 1 It is a structural schematic diagram of the best embodiment of the large-scale submerged ring polishing machine of the present invention. As can be seen from the figure, the large-scale submerged ring polishing machine of the present invention includes a marble polishing disc 5 driven by a motor 1, and the upper surface of the polishing disc is poured One layer of uniform polishing rubber plate 9, a circular glass calibration plate 10 is placed on the polishing rubber plate, and both the polishing rubber plate 9 and the glass calibration plate 10 are placed in a large liquid storage tank 8; the liquid storage tank 8 is Annular groove, its inner circumference is fixed on the circumference of the outer edge of marble polishing disc 5 by fastening screws, and rotates t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A large immersion type ring polishing machine mainly comprises a marble polishing disc, a large liquid storage groove, a polishing solution storage tank, a magnetic stirrer, an electric pump, a polishing solution filtering device, a spraying nozzle device and the like. The magnetic stirrer is arranged in the polishing solution storage tank and performs continuous stirring. The polishing solution filtering device adopts a multilayer filtering film type filtering device and can perform multilayer grading filtering according to needs. By means of the large immersion type ring polishing machine, immersion type polishing processing of the large immersion type ring polishing machine is achieved, temperature balance performance is good, polishing surface shape errors caused by uneven polishing temperature are reduced, surface shape precision and surface roughness of a large-caliber plane optical element are improved, and surface defects of elements can be effectively controlled. Furthermore, the immersion type ring polishing machine adopts a mode of cyclic utilization of polishing solution, so that consume of the polishing solution can be greatly reduced, and processing cost is reduced.

Description

technical field [0001] The invention relates to optical element surface or wafer polishing equipment in microelectronics, especially a large ring polishing machine for precision polishing the surface of large-scale optical glass components, especially for plane optics with high surface shape accuracy and surface roughness in the ring polishing process. Component processing. Background technique [0002] Ring polishing machine is almost the only large-caliber, global planar optical element processing technology in the world at present. It rotates the workpiece to be polished relative to the polishing rubber disc under a certain pressure and the presence of polishing liquid. The mechanical grinding action and the corrosive action of chemical oxidants complete the material removal on the surface of the workpiece and obtain a smooth surface. Compared with other technologies, this technology can simultaneously achieve local and global planarization of large-diameter workpieces, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B29/02
Inventor 顿爱欢顾建勋陈国凯吴福林张宝安徐学科
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products