Artificial schisandra chinensis seed preparation and seedling culture method
A technology of artificial seeds and Schisandra chinensis, applied in the field of medicine, can solve the problems of low reproduction coefficient, long aseptic operation process, labor and material resources consumption, etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
example 1
[0021] 1-4 steps of operation refer to the content of the invention part (1) ~ (4), that is, the explant of the fine variety Schisandra chinensis is used as the starting material, after the surface is sterilized successively by 75% alcohol and saturated sodium hypochlorite solution, it is cut into small pieces and placed in the ultra-clean Inoculate the workbench containing 0.5-2 mg / L of 2,4-dichlorophenoxyacetic acid, 1.0-3.0 mg / L of 6-benzylaminopurine, 15-30 g / L of sucrose, and 0.5-1% of agar, and adjust the final pH to Callus induction was carried out in sterile MS solid medium (callus induction medium) between 5.5 and 6.5 at 25±1° C. under dark culture conditions.
[0022] Select light yellow-green, loose texture, and vigorously growing callus, inoculate it into the callus induction medium without agar, establish its suspension culture condition, and obtain vigorous growth and uniform cell suspension.
[0023] After obtaining a sufficient amount of cell suspension, filter...
example 2~5
[0027] With reference to Example 1 step, change the concentration / ratio of each variable and carry out the preparation and seedling cultivation experiment of artificial seeds, the results are as follows:
[0028]
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com