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Repair method for surface-damaged growth point of melted quartz element

A surface damage and repair method technology, applied in the field of fused silica components, can solve problems such as damage and growth of fused silica components, and achieve the effects of increased growth threshold, high stability, and extended service life

Inactive Publication Date: 2013-08-07
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In order to solve the problem of damage growth of fused silica components, the present invention provides a repair method for improving the ability of components to resist laser damage

Method used

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  • Repair method for surface-damaged growth point of melted quartz element
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  • Repair method for surface-damaged growth point of melted quartz element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] 1. Sample preparation: ultrasonically clean the fused silica substrate with deionized water, alkaline cleaning agent, and deionized water for 5 minutes each, and dry naturally in a clean room to obtain a clean fused silica element; use Nd with a wavelength of 355 nm : YAG laser irradiates on the surface of the fused silica element to generate damage points. A Leica optical microscope was used to measure the lateral size of the damage point on the surface of the fused silica element, and a Bruker step meter was used to test the longitudinal depth of the damage point. The transverse dimension of the damage point was measured to be 150 microns, and the longitudinal depth was 5 microns.

[0031] 2. Femtosecond laser repair: The femtosecond laser repair device is used to repair the damaged point by "raster scanning". The specific repair process parameters are: laser energy is 70 microjoules, the horizontal distance X of the "raster scanning" movement is 200 microns, the ver...

Embodiment 2

[0036] 1. Sample preparation: ultrasonically clean the fused silica substrate with deionized water, alkaline cleaning agent, and deionized water for 5 minutes each, and dry naturally in a clean room to obtain a clean fused silica element; use Nd with a wavelength of 355 nm : YAG laser irradiates on the surface of the fused silica element to generate damage points. A Leica optical microscope was used to measure the lateral size of the damage point on the surface of the fused silica element, and a Bruker step meter was used to test the longitudinal depth of the damage point. The measured lateral dimension of the damaged spot was 240 microns, and the longitudinal depth was 9 microns.

[0037]2. Femtosecond laser repair: The femtosecond laser repair device is used to repair the damaged point by "raster scanning". The specific repair process parameters are: energy is 80 microjoules, the horizontal distance X of "raster scanning" movement is 300 microns, the vertical distance Y is ...

Embodiment 3

[0042] 1. Sample preparation: ultrasonically clean the fused silica substrate with deionized water, alkaline cleaning agent, and deionized water for 5 minutes each, and dry naturally in a clean room to obtain a clean fused silica element; use Nd with a wavelength of 355 nm : YAG laser irradiates on the surface of the fused silica element to generate damage points. A Leica optical microscope was used to measure the lateral size of the damage point on the surface of the fused silica element, and a Bruker step meter was used to test the longitudinal depth of the damage point. The transverse dimension of the damage point was measured to be 380 microns, and the longitudinal depth was 11 microns.

[0043] 2. Femtosecond laser repair: The femtosecond laser repair device is used to repair the damaged point by "raster scanning". The specific repair process parameters are: energy is 90 microjoules, the horizontal distance X of the "raster scanning" movement is 450 microns, the vertical...

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Abstract

The invention relates to a repair method for a surface-damaged growth point of a melted quartz element. The method comprises the following steps of: measuring the surface-damaged growth point of melted quartz; repairing the damaged point by femtosecond laser; corroding by using a hydrofluoric acid liquid; and cleaning. Thermal stress can be avoided through adoption of femtosecond laser for repairing the damaged point. The step of hydrofluoric acid liquid corrosion is used for removing re-sediment left after femtosecond laser treatment. Experimental test shows that the laser damage growth threshold value of the melted quartz element which is repaired according to the method is greatly enhanced, the service life of the element is prolonged, and the method has the characteristics of good repeatability and high stability.

Description

technical field [0001] The invention relates to a fused silica element, in particular to a method for repairing laser damage points on the surface of the fused silica element. Background technique [0002] Fused silica material has good optical, thermal and mechanical properties, and is the preferred material for strong laser optical components. It is widely used in large-scale high-power laser systems to prepare optical components such as lenses, windows and anti-sputter screens. However, under the irradiation of ultraviolet high-flux laser, the surface of fused silica components is prone to laser damage, and the lateral and vertical dimensions of such damage points increase exponentially under the action of subsequent pulsed lasers, which limits the service life of the components. At present, the problem of UV laser damage and development of fused silica components is a key factor limiting the operating throughput of high-power laser systems. Therefore, if the damage poin...

Claims

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Application Information

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IPC IPC(8): C03C15/00
Inventor 方周陈顺利赵元安胡国行刘晓凤李大伟邵建达
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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