Double-eccentric bushing regulating device for rotation balance of high-rotating-speed polishing head

Abstract

The invention discloses a double-eccentric bushing regulating device for the rotation balance of a high-rotating-speed polishing head. The double-eccentric bushing regulating device is applied to the driving and high-speed polishing processing of optical elements with medium and large calibers, a small eccentric bushing, a large eccentric bushing and a cylinder body form a double-eccentric bushing structure for regulating the eccentricity, and an eccentric hole per se (a matched and connected position of the small eccentric bushing and the cylinder body) is driven to do revolution movement around an axial line of a main shaft in the rotating process of the small eccentric bushing; through the relative rotation, the relative circumference position of the small eccentric bushing and the large eccentric bushing is regulated, the axis distance between the small eccentric bushing and the large eccentric bushing is changed, the polishing distance is regulated, and a polishing disc can obtain different revolution radii for adapting to the polishing requirements of different workpieces; and in the eccentric distance regulating process, the whole mass gravity center is always on the rotating center of the main shaft. When the structure is adopted, greater centrifugal force cannot be generated in the polishing rotation process, the rotary movement stability is ensured, and the rotating speed of the rotary polishing head can be improved, so the polishing efficiency of a polishing machine is improved.

Description

technical field [0001] The invention relates to a double eccentric sleeve adjustment device for the rotation balance of a high-speed polishing head, which is suitable for active and high-speed polishing processing of medium and large diameter optical elements. Background technique [0002] The polishing head structure system in the existing small tool polishing machine tools at home and abroad adopts dovetail grooves to adjust the eccentricity. When the eccentricity reaches a certain distance, a large centrifugal force will be generated during the high-speed rotation, causing the vibration of the polishing head and the vibration of the machine tool. Then it deflects, the movement is not stable, and the polishing accuracy is difficult to meet the expected requirements, which reduces the polishing efficiency and slows down the convergence of surface accuracy. Contents of the invention [0003] The object of the present invention is to provide a double eccentric sleeve adjust...

AI Technical Summary

Problems solved by technology

[0002] The polishing head structure system in the existing small tool polishing machine tools at home and abroad adopts dovetail grooves to adjust the eccentricity. When the eccentricity reaches a certain distance, a large centrifugal force will be generated during the high-speed rotation, causing the vibration of the polishing head and the vibration of the machine tool. Then it deflects, the movement is not stable, and the polishing accuracy is difficult to meet the expected requirements, which reduces the polishing efficiency and slows down the convergence of surface accuracy.

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