Method for manufacturing micro-lens array

Abstract

The invention provides a method for manufacturing a micro-lens array. The method comprises the following steps of: manufacturing an etching mask pattern on a gallium-series semiconductor substrate, wherein a plurality of circular-hole arrays are distributed on the etching mask pattern, and the circular-hole arrays correspond to a micro-lens array to be manufactured in position and shape; horizontally putting the gallium-series semiconductor substrate with the etching mask pattern into a corrosive solution which can generate Br2 for carrying out corrosion, wherein the solute of the corrosive solution is a reactant capable of generating Br2, and the solvent of the corrosive solution is an auxiliary solvent with a low melting point; and removing the etching mask pattern from the gallium-series semiconductor substrate to form the micro-lens array. According to the method provided by the invention, due to the use of a low-temperature etchant solution, a lateral under-etching effect in a corrosion process is effectively reduced and the transverse dimension of the micro-lens can be effectively restricted.

Description

technical field [0001] The invention belongs to the technical field of semiconductor materials and devices, and relates to a method for preparing a microlens array on a semiconductor surface by using a diffusion-limited temperature-variable corrosion technique. Background technique [0002] In the field of optoelectronic device technology, improving the collection efficiency of light-emitting devices, compressing the light output angle and stabilizing the light field mode is always the eternal development direction. Different device structures including waveguides, periodic surfaces, and microcavities are widely used in this field, but at the same time, there are different problems such as cumbersome and complex processes, long periodicity, high cost, and low yield. Microlens arrays are increasingly used as a good alternative in more and more scientific fields. The traditional methods of preparing microlens arrays include step-by-step photolithography, femtosecond laser or ...

AI Technical Summary

Problems solved by technology

However, the traditional method based on diffusion-limited etching to prepare microlens arrays is mainly at room temperature, and the lateral undercutting is carried out simultaneously with the corrosion in the depth direction, and the smaller radius of curvature is often at the expense of lateral corrosion. At the same time, due to the temperature dependence of diffusion, it is difficult to achieve a further breakthrough in the radius of curvature for corrosion at room temperature, and the traditional solution preparation also limits the corrosion temperature used.

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