Pixel structure and manufacturing method for the pixel structure

Abstract

A pixel structure and a manufacturing method of the pixel structure. Firstly, an insulating layer and a planar layer are formed on the electrode, and the planar layer has a first opening to expose the insulating layer on the electrode. A conductive layer is formed on the planar layer, and the conductive layer is filled into the first opening. A patterned photoresist layer is formed with etched openings exposing the conductive layer above the electrodes. Using the patterned photoresist layer as a mask, perform a wet etching process on the conductive layer, remove the conductive layer on the electrode through the etching opening, and laterally etch the conductive layer under the patterned photoresist layer to form a second opening. The conductive layer is patterned, and the second opening is located in the first opening, exposing the insulating layer above the electrode. The patterned photoresist layer is used as a mask, and the insulating layer is subjected to a dry etching process, and the insulating layer above the electrode is removed through the etching opening to form a patterned insulating layer with a third opening that exposes the electrode. The third opening is smaller than The second opening is self-aligned with the second opening.

Description

【Technical field】 [0001] The present invention relates to a pixel structure and a manufacturing method of the pixel structure, and in particular to a high-resolution pixel structure and a manufacturing method of the pixel structure. 【Background technique】 [0002] Generally speaking, a pixel structure of a high-resolution display includes a thin film transistor and a pixel electrode electrically connected to the thin film transistor. The thin film transistor is configured on the substrate, including gate, gate dielectric layer, channel layer, source and drain. Generally, a thick flat layer is used to improve the flatness and make the liquid crystal rotate more smoothly. The flat layer is disposed on the substrate and has a first opening exposing part of the drain. The capacitor electrode is arranged on the planar layer and filled into the first opening, and the capacitor electrode has a second opening exposing the drain. The patterned insulating layer is disposed on the ca...

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Problems solved by technology

As a result, a short circuit occurs between the capacitor electrode and the drain

In order to avoid the above situation, it is necessary to increase the distance between the capacitive electrode and the edge of the first opening of the flat layer by means of overexposure, etc., which may make it difficult to control the critical dimensions and improve the resolution of the pixel structure.

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